Get started
Author

Hikari Tomori

Observed names: H Tomori, H. Tomori, Hikari TOMORI
Observed institutions: Tokai University, University of Tsukuba, National Institute for Materials Science, Japan Science and Technology Agency, Tokyo Electron Kyushu Ltd (Japan), Research Center for Materials Nanoarchitectonics
ORCID: 0000-0003-0993-3416
Observed ORCID: 0000-0003-0993-3416
OpenAlex ID: A5061505258
Introducing Nonuniform Strain to Graphene Using Dielectric Nanopillars
2011 · Hikari Tomori, Akinobu Kanda, et al. · Applied Physics Express · 131
PDF
Dependence of proximity-induced supercurrent on junction length in multilayer-graphene Josephson junctions
2010 · A. Kanda, T. Sato, et al. · Physica C Superconductivity · 15
Fabrication of ultrashort graphene Josephson junctions
2010 · H. Tomori, A. Kanda, et al. · Physica C Superconductivity · 14
Nb3Sn superconductors prepared from intermediate compound phase
1996 · K. Tachikawa, M. Natsuume, et al. · Cryogenics · 11
Effect of current annealing on electronic properties of multilayer graphene
2010 · S Tanaka, H Goto, et al. · Journal of Physics Conference Series · 9
PDF
Advanced processes in metal-oxide resists for high-NA EUV lithography
2024 · Cong Que Dinh, Seiji Nagahara, et al. · Advances in Patterning Materials and Processes · 6
Advanced Development Techniques for Extreme-Tight Pitch Patterning
2024 · Hikari Tomori, Cong Que Dinh, et al. · Journal of Photopolymer Science and Technology · 4
Improved method for determining crystallographic orientation of strained graphene by Raman spectroscopy
2020 · Hikari Tomori, Kazushi Nakamura, et al. · Applied Physics Express · 4
PDF
Improved high-field performance in Nb/sub 3/Sn conductor prepared from intermediate compound
1997 · K. Tachikawa, Y. Kuroda, et al. · IEEE Transactions on Applied Superconductivity · 4
Advanced development for contact-holes of metal-oxide resists
2023 · Cong Que Dinh, Seiji Nagahara, et al. · International Conference on Extreme Ultraviolet Lithography · 3
Tight-pitch contact-hole patterns in EUV lithography
2025 · Cong Que Dinh, Nathan Antonovich, et al. · Advances in Patterning Materials and Processes · 2
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography
2024 · Kayoko Cho, Cong Que Dinh, et al. · Journal of Photopolymer Science and Technology · 2
Roughness improvement by post-development treatment of CAR for high-NA EUV lithography
2024 · Kayoko Cho, Hikari Tomori, et al. · Advances in Patterning Materials and Processes · 2
Theory of the Strain Engineering of Graphene Nanoconstrictions
2021 · Masahiko Hayashi, Hideo Yoshioka, et al. · Journal of the Physical Society of Japan · 2
PDF
Electron transport in a bilayer graphene/layered superconductor NbSe2junction: effect of work function difference
2018 · Katsuhide Yarimizu, Hikari Tomori, et al. · Journal of Physics Conference Series · 2
PDF
High-Field Performance of Nb3Sn Superconductors Prepared from Intermediate Compound
1998 · K. Tachikawa, Y. Kuroda, et al. · Springer eBooks · 2
High-Field Nb3Sn Superconductors Prepared through a New Route
1996 · K. Tachikawa, M. Natsuume, et al. · Springer eBooks · 2
Application of new development technology to ultra-narrow pitch patterns formed by electron beam lithography
2025 · Hikari Tomori, Kayoko Cho, et al. · Advances in Patterning Materials and Processes · 1
Influence of focused-ion-beam microfabrication on superconducting transition in exfoliated thin films of layered superconductor NbSe2
2019 · Hikari Tomori, Naoki Hoshi, et al. · Journal of Physics Conference Series · 1
PDF
Response of a superconductor NbSe2 flake to magnetic field detected with small tunnel junctions
2019 · Naoki Hoshi, Dai Inoue, et al. · Journal of Physics Conference Series · 1
PDF
Surface morphology of multilayer graphene synthesized directly on silicon dioxide
2013 · Kenta Katakura, Hikari Tomori, et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 1
Application of the Stochastic Simulation Algorithm to Exposure and Post-Exposure Bake in EUV Chemically Amplified Resists
2026 · Kenji Yoshimoto, Soma Tachibana, et al. · Journal of Photopolymer Science and Technology
PDF
Probing latent image contrast in metal oxide resists by density-based analysis
2026 · Kayoko Cho, Teruhiko Kodama, et al. · Advances in Patterning Materials and Processes
Electron beam lithography validation of a new resist development for ultrafine patterns
2026 · Hikari Tomori, Kayoko Cho, et al. · Advances in Patterning Materials and Processes
Fundamental understanding of the development process for metal oxide photoresists
2025 · Ankur Agarwal, Arnaud Dauendorffer, et al. · Advances in Patterning Materials and Processes
Works count: 67
Citation count: 219
H-index: 6
I10-index: 4
Year
Topic
Type