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Junjiang Lei

Approximation from Shift-Invariant Spaces by Integral Operators
1997 · Junjiang Lei, Rong-Qing Jia, et al. · SIAM Journal on Mathematical Analysis · 60
Wavelets: Algorithms & Applications.
1994 · Junjiang Lei, Yves Meyer, et al. · Mathematics of Computation · 18
Lp-Approximation by Certain Projection Operators
1994 · J.J. Lei · Journal of Mathematical Analysis and Applications · 18
Model-based OPC using the MEEF matrix II
2014 · Junjiang Lei, Le Hong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Approximation by Piecewise Exponentials
1991 · Junjiang Lei, Rong-Qing Jia · SIAM Journal on Mathematical Analysis · 17
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
2015 · Yuansheng Ma, Junjiang Lei, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
A study of ILT-based curvilinear SRAF with a constant width
2022 · Yan Xu, Jiechang Hou, et al. · SPIE Photomask Technology Conference · 8
Directed self-assembly graphoepitaxy template generation with immersion lithography
2015 · Yuansheng Ma, Junjiang Lei, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 8
Coordinate Order of Approximation by Functional-Based Approximation Operators
1995 · H.G. Burchard, J.J. Lei · Journal of Approximation Theory · 8
Fast full chip curvilinear MRC for advanced manufacturing nodes
2024 · Nassima Zeggaoui, Rachit Sharma, et al. · DTCO and Computational Patterning · 7
Directed self-assembly compliant flow with immersion lithography: from material to design and patterning
2016 · Yuansheng Ma, Yan Wang, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 7
Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning
2016 · Yuansheng Ma, Yan Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Can fast rule-based assist feature generation in random-logic contact layout provide sufficient process window?
2012 · Ahmed Omran, George Lippincott, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Design technology co-optimization for 14/10nm metal1 double patterning layer
2016 · Yingli Duan, Xiaojing Su, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer
2017 · Xiaojing Su, Lisong Dong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Design technology co-optimization for N14 Metal1 layer
2016 · Yingli Duan, Xiaojing Su, et al. · China Semiconductor Technology International Conference (CSTIC) · 4
Simulations of immersion lithography
2005 · Min Bai, Junjiang Lei, et al. · Optical Microlithography XVIII · 4
Model-based OPC using the MEEF matrix III
2024 · Junjiang Lei, Yi Yang, et al. · DTCO and Computational Patterning · 3
Hopkins equation in Hilbert space and its application in polarized illumination modeling
2005 · Junjiang Lei, Min Bai, et al. · Optical Microlithography XVIII · 3
Dynamic feedback controller for optical proximity correction
2011 · Ahmed Omran, Jochen Schacht, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Approximation of Hopkins equation in Hilbert space and its application in polarized illumination modelling
2009 · Junjiang Lei, Jie-Chang Wen, et al. · Applicable Analysis · 2
Quasi-Interpolation on Irregular Points
1994 · E. W. Cheney, Junjiang Lei · Birkhäuser Boston eBooks · 2
Fast full-chip curvilinear ILT mask generation with machine learning technology
2022 · Yuangsheng Ma, Rui Wu, et al. · DTCO and Computational Patterning · 1
Optimizing curvilinear ILT recipe development with machine learning based pattern selection
2021 · Yuansheng Ma, Rui Wu, et al. · SPIE Photomask Technology Conference · 1
Symmetry enhancement method for process modeling and its applications in IC design and OPC
2002 · Junjiang Lei, Michael Sanie, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 30
Citation count: 226
H-index: 8
I10-index: 6
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