Author

Marieke Meeuwissen

Observed institution: ASML (Netherlands)

ORCID: 0000-0003-2779-2442

Observed ORCID: 0000-0003-2779-2442

OpenAlex ID: A5063974383

Improvements in resist performance towards EUV HVM

2017 · Oktay Yildirim, Elizabeth Buitrago, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 69

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High-power EUV lithography: spectral purity and imaging performance

2020 · Mark A. van de Kerkhof, Fei Liu, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 37

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Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

2016 · Elizabeth Buitrago, Seiji Nagahara, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 25

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Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

2016 · Seiji Nagahara, Michael Carcasi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

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Progress in EUV resists towards high-NA EUV lithography

2019 · Xiaolong Wang, Zuhal Tasdemir, et al. · Extreme Ultraviolet (EUV) Lithography · 21

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State-of-the-art EUV materials and processes for the 7nm node and beyond

2017 · Elizabeth Buitrago, Marieke Meeuwissen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20

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Novel high sensitivity EUV photoresist for sub-7nm node

2016 · Tomoki Nagai, Hisashi Nakagawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node

2016 · Tomoki Nagai, Hisashi Nakagawa, et al. · Journal of Photopolymer Science and Technology · 19

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Chemically-amplified EUV resists approaching 11 nm half-pitch

2018 · Iacopo Mochi, Karen Garrido Olvera, et al. · Extreme Ultraviolet (EUV) Lithography · 12

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Spectral purity performance of high-power EUV systems

2020 · Mark A. van de Kerkhof, Fei Liu, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 10

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Evaluation of EUV resists for 5nm technology node and beyond

2018 · Zuhal Tasdemir, Iacopo Mochi, et al. · International Conference on Extreme Ultraviolet Lithography · 10

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Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

2016 · Elizabeth Buitrago, Seiji Nagahara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

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Impact of acid statistics on EUV local critical dimension uniformity

2017 · Jing Jiang, Danilo De Simone, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

2017 · Zuhal Tasdemir, Yasin Ekinci, et al. · International Conference on Extreme Ultraviolet Lithography · 3

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11nmハーフピッチに近づく化学増幅EUVレジスト【JST・京大機械翻訳】

2018 · Tasdemir Zuhal, Michaela Vockenhuber, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Bond surface analysis using Fourier Transform Infrared Spectroscopy (FTIR) and X-Ray Photoelectron Spectroscopy (XPS)

2012 · Amandeep Singh Virk, Luigi‐Jules Vandi, et al.

Works count: 16

Citation count: 282

H-index: 10

I10-index: 12