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Author

Haoming Che

ORCID: 0009-0004-9913-0610
Observed ORCID: 0009-0004-9913-0610
OpenAlex ID: A5064355955
Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
2026 · Haoming Che, Takashi Onaya, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1
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A Novel 1.2kV Snap-back Suppressed RC-VIGBT with Small Switching Energy Loss and Simple Fabrication Process
2023 · Suyang Liu, Gai Tsukamoto, et al. · IEEE Electron Devices Technology & Manufacturing Conference (EDTM) · 1
Predictive Rollout Resource Scheduling for Layered Counter-UAS Defense Under Saturation Attacks
2026 · Yizhe Wang, Tielei Li, et al. · Communications in computer and information science
(Invited) Design of Ferroelectric Hf x Zr 1−X O 2 Thin Films and Interfaces Formation Process by Using Atomic Layer Deposition
2026 · Takashi Onaya, Haoming Che, et al. · ECS Meeting Abstracts
Simulation study on dynamic characteristics of SiC MOSFET
2023 · Haoming Che · Theoretical and Natural Science
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Works count: 5
Citation count: 2
H-index: 1
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