Author

Franz X. Zach

Observed names: F. X. Zach, F. Zach, F.X. Zach, Franz Zach, Zach, F.X.

Observed institutions: Siemens (Germany), IBM (United States), Lawrence Berkeley National Laboratory, IBM Research and Development Inc. (United States), University of Regensburg, KLA (United States)

OpenAlex ID: A5065966165

Signal and Power Integrity

2008 · Ban Wong, Franz Zach, et al. · 72

New insights into the compensation mechanism of Fe-doped InP

1994 · F. X. Zach · Journal of Applied Physics · 41

Optical Mapping of the Total EL2-Concentration in Semi-Insulating GaAs-Wafers

1989 · F. X. Zach, A. Winnacker · Japanese Journal of Applied Physics · 35

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Electrical properties of the hydrogen defect in InP and the microscopic structure of the 2316 cm−1 hydrogen related line

1996 · F. X. Zach, E. E. Haller, et al. · Journal of Electronic Materials · 29

Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for Sub-65nm Technology Nodes

2008 · Ban P. Wong, Anurag Mittal, et al. · 26

Nano‐CMOS Design for Manufacturabililty

2008 · Ban Wong, Franz Zach, et al. · Wiley eBooks · 20

Growth and characterization of ZnSe grown by organometallic vapor phase epitaxy using diisopropyl selenide and diethyl zinc

1995 · Edith D. Bourret, Franz X. Zach, et al. · Journal of Crystal Growth · 14

Vibrational spectroscopy of arsenic-hydrogen complexes in ZnSe

1996 · M. D. McCluskey, E. E. Haller, et al. · Applied Physics Letters · 13

Neural-network-based approach to resist modeling and OPC

2004 · Franz X. Zach · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Subresolution assist feature implementation for high-performance logic gate-level lithography

2002 · Allen H. Gabor, James A. Bruce, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Sequential PPC and process-window-aware mask layout synthesis

2006 · Apo Sezginer, Franz X. Zach, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks

2001 · Franz X. Zach, Chieh-yu Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Subwavelength alignment mark signal analysis of advanced memory products

2000 · Xiaoming Yin, Alfred K. K. Wong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

The distribution of the deep donor EL2 and the net acceptor concentration in semi-insulating GaAs

1990 · A. Winnacker, F.X. Zach · Journal of Crystal Growth · 5

Process dependencies of optical proximity corrections

2001 · Franz X. Zach, Donald J. Samuels, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Multi-metrology: towards parametric yield predictions beyond EPE

2023 · Franz X. Zach, Srividya Cancheepuram, et al. · Metrology, Inspection, and Process Control XXXVI · 3

Building a computational model for process and proximity compensation

2006 · Gökhan Perçin, Hsu-Ting Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

On the Electron Photoionization Cross-Section of EL2 in GaAs

1989 · A. Winnacker, F. X. Zach · Japanese Journal of Applied Physics · 3

Effect of impact ionization on the saturation of 1s?2p+ shallow donor transition in n-GaAs

1988 · M. Weispfenning, F. Zach, et al. · International Journal of Infrared and Millimeter Waves · 3

Advanced processing control for wafer-to-wafer hybrid bonding

2024 · Nikhil Aditya Kumar Roy, Richard Housley, et al. · Metrology, Inspection, and Process Control XXXVI · 2

EPE monitoring with enhanced metrology using KLA pattern-centric solutions

2024 · Huan Ren, Kaushik Sah, et al. · Metrology, Inspection, and Process Control XXXVI · 2

SAQP pitch walk metrology using single target metrology

2017 · Fang Fang, Pedro Herrera, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Optimization of segmented alignment marks for advanced semiconductor fabrication processes

2001 · Qiang Wu, Zhijian G. Lu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

1999 · Zhijian G. Lu, Yuping Cui, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Slotted vias for dual damascene interconnects in 1 Gb DRAMs

1999 · R.F. Schnabel, G. Bronner, et al. · Symposium on VLSI Technology · 2

Works count: 48

Citation count: 322

H-index: 10

I10-index: 10