2019 · Isabella Rossetto, Rossella Piagge, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 5

Evaluation of HfLaOx as Blocking Layer for Innovative Nonvolatile Memory Applications

2010 · Annalisa Del Vitto, Rossella Piagge, et al. · ECS Transactions · 5

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A12O3 optimization for Charge Trap memory application

2008 · C. Scozzari, G. Albini, et al. · Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon · 5

High-K dielectrics for inter-poly application in non volatile memories

2007 · A. Sebastiani, R. Piagge, et al. · Microelectronics Reliability · 5

Modulation of Si(100) electronic surface density due to supramolecular interactions of gaseous molecules with self-assembled organic monolayers

2001 · Monica Bollani, Rossella Piagge, et al. · Materials Science and Engineering C · 5

Tellurium Contamination in Silicon

2012 · M. L. Polignano, D. Codegoni, et al. · ECS Journal of Solid State Science and Technology · 4

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Charge retention phenomena in CT silicon nitride: Impact of technology and operating conditions

2011 · G. Ghidini, N. Galbiati, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 4

Structural and Chemical Investigation of Annealed Al2O3 Films for Interpoly Dielectric Application in Flash Memories

2006 · Mauro Alessandri, Rossella Piagge, et al. · ECS Transactions · 4

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Metrology issues in thin ONO stacks measurements by spectroscopic ellipsometry and X-ray reflectivity

2004 · E. Bellandi, A. Elbaz, et al. · Thin Solid Films · 4

On the impact of silicon nitride technology on charge trap NAND memories

2009 · A. Sebastiani, C. Scozzari, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3

Electron density profile at the interface of SiO2/Si(0 0 1)

2006 · S. Banerjee, S. Ferrari, et al. · Applied Surface Science · 3

BE-TANOS: Feasibility and technology limitations

2011 · G. Ghidini, N. Galbiati, et al. · Microelectronic Engineering · 1

Charge retention phenomena in charge transfer silicon nitride: impact of technology and operating conditions

2011 · G. Ghidini, N. Galbiati, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1

High-k Materials in Flash Memories

2006 · Mauro Alessandri, Rossella Piagge, et al. · ECS Meeting Abstracts · 1

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Transmission line pulse (TLP) as integrative method for the investigation of ultra-fast trapping mechanisms on high-k MIM

2019 · L. Merlo, I. Rossetto, et al. · Microelectronics Reliability

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Hafnium Impurity Defects in Silicon: A Characterization

2018 · I. Mica, J. Frascaroli, et al. · ECS Journal of Solid State Science and Technology

LaHfOx Films Analyses for NVM Applications

2010 · Annalisa Del Vitto, Rossella Piagge, et al. · ECS Meeting Abstracts

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Works count: 34

Citation count: 215

H-index: 7

I10-index: 6