Author

Ngoc Le Trinh

Institutions: Incheon National University, Ulsan National Institute of Science and Technology

Observed institutions: Incheon National University, Ulsan National Institute of Science and Technology

ORCID: 0009-0008-5867-9024

Observed ORCID: 0009-0008-5867-9024

OpenAlex ID: A5068267472

Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer

2022 · Bonwook Gu, Ngoc Le Trinh, et al. · Chemistry of Materials · 26

Facile Approach for Designing Icephobic Coatings Using Polymers/Silica Nanoparticle Composites via Self‐Formation of Superhydrophobic Surfaces

2024 · Aravind H. Patil, Ngoc Le Trinh, et al. · Advanced Materials Interfaces · 20

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Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor

2023 · Chi Thang Nguyen, Eun-Hyoung Cho, et al. · Chemistry of Materials · 18

Atomic-Level Stoichiometry Control of Ferroelectric Hf x Zr y O z Thin Films by Understanding Molecular-Level Chemical Physical Reactions

2025 · Ngoc Le Trinh, Bonwook Gu, et al. · ACS Nano · 15

Synergistic effects of ionic liquid integrated superhydrophobic composite coatings on anti-icing properties

2025 · Aravind H. Patil, Ngoc Le Trinh, et al. · Applied Surface Science · 10

Ultrathin Ag Film of Transparent Electrode for Flexible Schottky Photodetection and Enhanced Charge Transport

2025 · Sanh Vo Thi, Malkeshkumar Patel, et al. · ACS Applied Electronic Materials · 7

Functionalization of Si 3 N 4 with an aldehyde inhibitor for area selective deposition of HfO 2 and SiO 2

2025 · Byungchan Lee, Seungwon Shim, et al. · Journal of Materials Chemistry C · 6

Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films

2026 · Ngoc Le Trinh, Wonjoong Kim, et al. · ACS Nano · 3

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Area selective deposition of tungsten and ruthenium using a tungsten precursor inhibitor

2025 · Bonwook Gu, Chi Thang Nguyen, et al. · Applied Surface Science · 3

AI-Driven Inverse Design of Complex Oxide Thin Films for Semiconductor Devices: A Case Study of Hf–Zr–O

2026 · Bonwook Gu, Ngoc Le Trinh, et al. · Chemistry of Materials · 2

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Atomic Layer Modulation of Ruthenium Aluminum Oxide through Reactivity Control of Precursors for Seedless Copper Interconnects

2025 · Chi Thang Nguyen, Miso Kim, et al. · Chemistry of Materials · 2

Cobalt Precursor as Surface Inhibitor for Area-Selective Atomic Layer Deposition of Nanoscale Electronic Interconnects

2026 · Zunair Masroor, Ngoc Le Trinh, et al. · ACS Applied Nano Materials · 1

Defect engineering and improving dielectric performance of Y-doped ZrO2 ultrathin film through atomic layer modulation

2026 · Ngoc Le Trinh, Wonjoong Kim, et al. · Applied Surface Science

Transparent and Photovoltaic Water–Semiconductor Interface for Ultra‐Low‐Light Omnidirectional Photodetection

2026 · Sanh Vo Thi, Malkeshkumar Patel, et al. · Energy & environment materials

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A Dual-Si Atomic Precursor Enabling High-Quality SiN x Thin Films via Very High-Frequency Plasma Atomic Layer Deposition

2026 · Young-Jin Lim, Yujin Lee, et al. · Chemistry of Materials

Author response for "Tuning Surface Reactivity Pathways through Molecular Inhibitor Redosing for Precision Nanopatterning"

2026 · Byungchan Lee, Chi Thang Nguyen, et al. · Publons reviews and discussion

Tuning surface reactivity pathways through molecular inhibitor redosing for precision nanopatterning

2026 · Byungchan Lee, Chi Thang Nguyen, et al. · Materials Horizons

Atomic-Layer Sequence Engineering for Thermally Robust Ultrathin High-k Dielectrics

2026 · Byung-Ha Kwak, Ngoc Le Trinh, et al. · SSRN Electronic Journal

Works count: 18

Citation count: 113

H-index: 6

I10-index: 5