Get started
Author

Shigeo Irie

Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
1999 · Nobuyuki N. Matsuzawa, Hiroaki Oizumi, et al. · Japanese Journal of Applied Physics · 48
PDF
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
2001 · Takeo Watanabe, Hiroo Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37
Theoretical estimation of absorption coefficients of various polymers at 13 nm
2000 · Nobuyuki N. Matsuzawa, Hiroaki Oizumi, et al. · Microelectronic Engineering · 29
Theoretical Estimation of Absorption Coefficients of Various Polymers at 13nm
1999 · Nobuyuki N. Matsuzawa, Hiroaki Oizumi, et al. · Journal of Photopolymer Science and Technology · 14
PDF
Development of the large field extreme ultraviolet lithography camera
2000 · T. Watanabe, H. Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 13
Fluoropolymer-based resists for a single-resist process of 157 nm lithography
2002 · M. Toriumi, T. Yamazaki, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11
A new monocyclic fluropolymer structure for 157-nm photoresists
2004 · Yoko Takebe, Masataka Eda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography
2000 · Takeo Watanabe, Hiroo Kinoshita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Characterization of Fluoropolymer Resist for 157-nm Lithography
2003 · Takuya Hagiwara, Shigeo Irie, et al. · Journal of Photopolymer Science and Technology · 8
PDF
Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer
2002 · Shigeo Irie, Masayuki Endo, et al. · Japanese Journal of Applied Physics · 8
Control of line edge roughness of ultrathin resist films subjected to EUV exposure
2001 · Manhyoung Ryoo, Shigeru Shirayone, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Recent advances of three-aspherical-mirror system for EUVL
2000 · Hiroo Kinoshita, Takeo Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Performances of resists for 157-nm lithography based on monocyclic fluoropolymers
2003 · Seiichi Ishikawa, Shigeo Irie, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography
2003 · Shigeo Irie, Masato Shigematsu, et al. · Journal of Photopolymer Science and Technology · 6
PDF
Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
2002 · Shigeo Irie, Masayuki Endo, et al. · Japanese Journal of Applied Physics · 6
Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography
2000 · Katsumi Sugisaki, Tetsuya Oshino, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Dry-etching resistance of fluoropolymers for 157-nm single-layer resists
2003 · Yasuhide Kawaguchi, Jun Irisawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Evaluation of the Outgassing from Resists at the EUV Wavelength.
2001 · Shigeo Irie, Hiroaki Oizumi, et al. · Journal of Photopolymer Science and Technology · 5
PDF
Pattern transfer processes for 157-nm lithography
2002 · Seiro Miyoshi, Takamitsu Furukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development for the alignment procedure of three-aspherical mirror optics
2000 · Shigeo Irie, Takeo Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of Resist Materials for EUVL.
2000 · Shigeo Irie, Shigeru Shirayone, et al. · Journal of Photopolymer Science and Technology · 4
PDF
Catalytic Decomposition of Perfluorocompounds
1997 · S. Kanno, S. Ikeda, et al. · MRS Proceedings · 4
Evaluation of outgassing from a fluorinated resist for 157nm lithography
2004 · Shigeo Irie, Takuya Hagiwara, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
2003 · Shigeo Irie, Seiichi Ishikawa, et al. · Japanese Journal of Applied Physics · 3
PDF
Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
2001 · Nobuyuki N. Matsuzawa, Shigeo Irie, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Works count: 53
Citation count: 286
H-index: 8
I10-index: 8
Year
Topic
Type