Author

Friso Wittebrood

Observed names: F Friso Wittebrood, F. Wittebrood

Observed institution: ASML (Netherlands)

OpenAlex ID: A5069591188

Contrast optimization for 0.33NA EUV lithography

2016 · Jo Finders, Sander Wuister, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 33

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

2017 · Joost Bekaert, Paolo Di Lorenzo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

2017 · V. M. Blanco Carballo, J. Bekaert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25

Assist features: placement, impact, and relevance for EUV imaging

2016 · Iacopo Mochi, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

N7 dark field two-bar in 0.33NA EUVL: Mitigation of CD Bossung tilts caused by strong coupling between the feature's primary and 1st self-image

2017 · T. Last, P. van Adrichem, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Alternative EUV mask technology to compensate for mask 3D effects

2015 · Lieve Van Look, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Patterning options for N7 logic: prospects and challenges for EUV

2015 · Eelco van Setten, Friso Wittebrood, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

High-NA EUV imaging: from system introduction towards low-k1 extension

2021 · Eelco van Setten, Jan van Schoot, et al. · International Conference on Extreme Ultraviolet Lithography · 5

NXE:3100 full wafer imaging performance and budget verification

2012 · Eelco van Setten, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Stitching for high-NA: zooming in on CDU budget

2023 · Natalia V. Davydova, Lieve van Look, et al. · International Conference on Extreme Ultraviolet Lithography · 3

High NA EUV has arrived, what are the upcoming challenges?

2025 · Jan van Schoot, Eelco van Setten, et al. · International Conference on Extreme Ultraviolet Lithography · 2

Focus sensing using placement and CD variation for high NA EUV lithography

2024 · Victor Calado, Simon G. J. Mathijssen, et al. · SPIE Optical and EUV Nanolithography · 2

Experimental validation of novel EUV mask technology to reduce mask 3D effects

2015 · Lieve Van Look, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

NXE:3400B imaging performance assessed from a customer perspective

2018 · Friso Wittebrood, Guido Schiffelers, et al. · International Conference on Extreme Ultraviolet Lithography · 1

Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility

2017 · Bartosz Bilski, Erik Wang, et al. · European Mask and Lithography Conference (EMLC) · 1

Experimental validation of novel mask technology to reduce mask 3D effects

2015 · Lieve Van Look, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Hydrogen decorated carbon nanotubes

2007 · F Friso Wittebrood · TU/e Research Portal

Works count: 17

Citation count: 157

H-index: 7

I10-index: 6