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Akshay Sahota
Institutions:
DuPont (United States),
The University of Texas at Dallas,
Kangwon National University,
Inha University,
Brookhaven National Laboratory,
Center for Functional Nanomaterials,
Hanyang University
show all 7
Observed institutions:
DuPont (United States),
The University of Texas at Dallas,
Kangwon National University,
Inha University,
Brookhaven National Laboratory,
Center for Functional Nanomaterials,
Hanyang University
show all 7
ORCID:
0000-0002-0609-1420
Observed ORCID:
0000-0002-0609-1420
OpenAlex ID:
A5069604359
A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films
2020
·
Si Joon Kim
, Jaidah Mohan
, et al.
·
Materials
·
61
PDF
Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant
2022
·
Yong Chan Jung
, Jin-Hyun Kim
, et al.
·
Applied Physics Letters
·
26
PDF
Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors
2022
·
Jaidah Mohan
, Yong Chan Jung
, et al.
·
ACS Applied Electronic Materials
·
17
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
2020
·
Harrison Sejoon Kim
, Su Min Hwang
, et al.
·
Journal of Materials Chemistry C
·
16
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
2021
·
Su Min Hwang
, Harrison Sejoon Kim
, et al.
·
ACS Applied Nano Materials
·
13
Extremely Low Leakage Threshold Switch with Enhanced Characteristics via Ag Doping on Polycrystalline ZnO Fabricated by Facile Electrochemical Deposition for an X-Point Selector
2021
·
Harrison Sejoon Kim
, Akshay Sahota
, et al.
·
ACS Applied Electronic Materials
·
12
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
2022
·
Su Min Hwang
, Harrison Sejoon Kim
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
8
A Novel Combinatorial Approach to the Ferroelectric Properties in HfxZr1−xO2 Deposited by Atomic Layer Deposition
2021
·
Yong Chan Jung
, Jaidah Mohan
, et al.
·
physica status solidi (RRL) - Rapid Research Letters
·
6
Highly Reliable Selection Behavior With Controlled Ag Doping of Nano-Polycrystalline ZnO Layer for 3D X-Point Framework
2021
·
Akshay Sahota
, Harrison Sejoon Kim
, et al.
·
IEEE Electron Device Letters
·
5
Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors
2021
·
Akshay Sahota
, Harrison Sejoon Kim
, et al.
·
AIP Advances
·
3
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Works count:
10
Citation count:
167
H-index:
7
I10-index:
6
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