Author

Martin Spieser

Observed names: M Spieser, M. Spieser, Spieser, Martin

Observed institutions: IBM Research - Zurich, SwissLitho (Switzerland), Technical University of Denmark

ORCID: 0009-0005-7345-7065

Observed ORCID: 0009-0005-7345-7065

OpenAlex ID: A5069781159

Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography

2019 · Xiaorui Zheng, Annalisa Calò, et al. · Nature Electronics · 172

Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography

2017 · Yu Kyoung Ryu Cho, Colin D. Rawlings, et al. · ACS Nano · 109

Thermal scanning probe lithography for the directed self-assembly of block copolymers

2017 · S Gottlieb, M Lorenzoni, et al. · Nanotechnology · 34

Intrinsically conductive polymer thin film piezoresistors

2008 · M. Lillemose, M. Spieser, et al. · Microelectronic Engineering · 30

Control of the interaction strength of photonic molecules by nanometer precise 3D fabrication

2017 · Colin D. Rawlings, Michal Zientek, et al. · Scientific Reports · 26

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

2017 · Y. Lisunova, M. Spieser, et al. · Microelectronic Engineering · 26

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer

2018 · Jean-François de Marneffe, Boon Teik Chan, et al. · ACS Nano · 25

Stabilization and control of topological magnetic solitons via magnetic nanopatterning of exchange bias systems

2018 · Edoardo Albisetti, Annalisa Calò, et al. · Applied Physics Letters · 19

Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography

2018 · Colin D. Rawlings, Tero S. Kulmala, et al. · SPIE Novel Patterning Technologies · 16

Comprehensive modeling of Joule heated cantilever probes

2017 · M. Spieser, C. Rawlings, et al. · Journal of Applied Physics · 13

Thermal Imaging of Block Copolymers with Sub-10 nm Resolution

2021 · Steven Gottlieb, Louis Pigard, et al. · ACS Nano · 12

High throughput lithography using thermal scanning probes

2017 · Colin Rawlings, Martin Spieser, et al. · International Conference on Solid-State Sensors, Actuators and Microsystems · 10

Efficient Tunnel Junction Lithographic Aperture 940 nm VCSEL

2023 · Antoine Pissis, Eimantas Duda, et al. · IEEE Photonics Technology Letters · 9

Thermal Scanning Probe Lithography (t-SPL) for Nano-Fabrication

2019 · Heiko Wolf, Yu K. Ryu Cho, et al. · Pan Pacific Symposium · 3

Controlling Coupling in TCC VCSEL with Lithographically Defined Cavities at 940nm

2024 · Giacomo Graziano, Antoine Pissis, et al. · IEEE International Semiconductor Laser Conference (ISLC) · 2

Corrigendum: Thermal scanning probe lithography for the directed self-assembly of block copolymers (2017 Nanotechnology 28 175301)

2017 · S Gottlieb, M Lorenzoni, et al. · Nanotechnology · 2

Ring Shaped Lithographic Aperture VCSEL

2025 · Giacomo Graziano, Marc Ganzhorn, et al. · Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) · 1

Inherently conductive polymer thin film piezoresistors

2007 · Michael Lillemose, Martin Spieser, et al. · Technical University of Denmark, DTU Orbit (Technical University of Denmark, DTU) · 1

Transverse detuned loading for modulation bandwidth enhancement in VCSELs

2026 · Graziano, Giacomo, Schatz, Richard, et al. · arXiv (Cornell University)

Mode control in ring lithographic aperture VCSELs

2026 · Giacomo Graziano, Antoine Pissis, et al. · APL Photonics

Etch transfer into silicon of patterns with a half-pitch of under 20nm

2016 · Armin Knoll, Colin Rawlings, et al. · SPIE Newsroom

Numerical optimizers for nanophotonic devices

2014 · Spieser, Martin · Repository for Publications and Research Data (ETH Zurich)

Works count: 22

Citation count: 510

H-index: 11

I10-index: 12