Author

Nicoló Morgana

Observed names: N. Morgana, Nicolo Morgana

Observed institutions: Infineon Technologies (Germany), Photronics (United States)

OpenAlex ID: A5069861619

Grayscale lithography: 3D structuring and thickness control

2013 · Marcel Heller, Dieter Kaiser, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

2007 · Mazen Saied, Franck Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Rigorous wafer topography simulation for investigating wafer alignment quality and robustness

2015 · Nicoló Morgana, Dmitrii Gavrilin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Double patterning down to k1=0.15 with litho trim

2009 · Christoph Noelscher, Marcel Heller, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3

Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window

2007 · M. Saied, F. Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Revival of grayscale technique in power semiconductor processing under low-cost manufacturing constraints

2018 · Jens Schneider, Dieter Kaiser, et al. · European Mask and Lithography Conference (EMLC) · 2

Tunable transmission phase mask options for 65/45nm node gate and contact processing

2005 · Bryan S. Kasprowicz, Will Conley, et al. · Optical Microlithography XVIII · 2

Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node

2005 · J. Heumann, J. Schramm, et al. · Optical Microlithography XVIII · 2

Characterization of inverse SRAF for active layer trenches on 45-nm node

2007 · Jean-Christophe Urbani, Jean-Damien Chapon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

2003 · Wolfgang Dettmann, Jan P. Heumann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Full-level alternating PSM for sub-100nm DRAM gate patterning

2003 · Rainer Pforr, Marco Ahrens, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Recipe for detecting mask house CD metrology mismatch using wafer dose-to-size for 130nm node manufacturing

2026 · Temitope Onanuga, Maria Esche, et al. · European Mask and Lithography Conference (EMLC)

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

2008 · Christoph Noelscher, Thomas Henkel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

2007 · Frank Sundermann, Yorick Trouiller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Polarization effects: EAPSM vs. TT EAPSM

2006 · Nicoló Morgana, Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Manufacturability and printability of AAPSM with transparent etch stop layer

2006 · Michael Cangemi, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High-transmission mask technology for 45nm node imaging

2006 · Will Conley, Nicoló Morgana, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical properties and process impacts of high transmission EAPSM

2006 · Young Mog Ham, Nicolo Morgana, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High transmission mask technology for 45nm node imaging

2006 · Will Conley, Nicoló Morgana, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Hard phase-shifting masks for the 65-nm node: a performance comparison

2004 · Rainer Pforr, Mario Hennig, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 20

Citation count: 42

H-index: 3

I10-index: 1