Author

Yu‐Sen Jiang

Observed names: Yu-Sen Jiang, Yusen Jiang

Institutions: National Taiwan University, Hubei University of Automotive Technology

Observed institutions: National Taiwan University, Hubei University of Automotive Technology

ORCID: 0000-0003-2622-2771

Observed ORCID: 0000-0003-2622-2771

OpenAlex ID: A5070515330

Sub-7-nm textured ZrO2 with giant ferroelectricity

2020 · Kuei-Wen Huang, Sheng-Han Yi, et al. · Acta Materialia · 52

Evolution of pronounced ferroelectricity in Hf 0.5 Zr 0.5 O 2 thin films scaled down to 3 nm

2021 · Chin-I Wang, Hsin-Yang Chen, et al. · Journal of Materials Chemistry C · 45

Sharp Transformation across Morphotropic Phase Boundary in Sub‐6 nm Wake‐Up‐Free Ferroelectric Films by Atomic Layer Technology

2023 · Chun‐Ho Chuang, Ting‐Yun Wang, et al. · Advanced Science · 32

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Atomic tailoring of low-thermal-budget and nearly wake-up-free ferroelectric Hf0.5Zr0.5O2 nanoscale thin films by atomic layer annealing

2022 · Teng-Jan Chang, Yu-Sen Jiang, et al. · Applied Surface Science · 29

Atomic layer deposited TiN capping layer for sub-10 nm ferroelectric Hf0.5Zr0.5O2 with large remnant polarization and low thermal budget

2021 · Chin-I Wang, Chun-Yuan Wang, et al. · Applied Surface Science · 29

Leakage current lowering and film densification of ZrO2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment

2020 · Kuei-Wen Huang, Teng-Jan Chang, et al. · Materials Science in Semiconductor Processing · 27

Impact of asymmetric electrodes on ferroelectricity of sub-10 nm HZO thin films

2023 · Hsing-Yang Chen, Yu-Sen Jiang, et al. · Nanotechnology · 15

Wake-up free Hf0.5Zr0.5O2 thin film with enhanced ferroelectricity and reliability synthesized by atomic layer crystallization induced by substrate biasing

2022 · Chun-Yi Chou, Hsing-Yang Chen, et al. · Acta Materialia · 14

Enhancement of Dielectric Properties of Nanoscale HfO 2 Thin Films Via Atomic Layer Bombardment

2020 · Yu-Tung Yin, Yu-Sen Jiang, et al. · ACS Applied Electronic Materials · 13

Ferroelectric ZrO2 ultrathin films on silicon for metal-ferroelectric-semiconductor capacitors and transistors

2022 · Yu-Sen Jiang, Kuei-Wen Huang, et al. · Journal of the European Ceramic Society · 12

Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer

2024 · Yu-Sen Jiang, Makoto Shiojiri, et al. · Acta Materialia · 9

Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks

2020 · Chin-I Wang, Teng-Jan Chang, et al. · ACS Applied Electronic Materials · 9

Inhibitor-Free Area-Selective Atomic Layer Deposition with Feature Size Down to Nearly 10 nm

2023 · Chun-Yi Chou, Chi-Lin Mo, et al. · Chemistry of Materials · 8

High-Quality HfO2 High-K Gate Dielectrics Deposited on Highly Oriented Pyrolytic Graphite via Enhanced Precursor Atomic Layer Seeding

2025 · Yu-Tung Yin, Chin-Chao Huang, et al. · ACS Applied Electronic Materials · 6

Operation bandwidth of negative capacitance characterized by the frequency response of capacitance magnification in ferroelectric/dielectric stacks

2020 · Yu-Sen Jiang, Yu-En Jeng, et al. · Journal of Materials Chemistry C · 6

Suppression of short channel effects in ferroelectric Si junctionless transistors with a sub-10 nm gate length defined by helium ion beam lithography

2021 · Teng-Jan Chang, Ting-Yun Wang, et al. · Journal of Materials Chemistry C · 5

Ferroelastic Domain Switching and Time‐Resolved Negative Capacitance in Polar‐Axis‐Oriented Hf 0.5 Zr 0.5 O 2 Grown by Atomic Layer Epitaxy

2024 · Yu‐Sen Jiang, Wei‐En Lin, et al. · Small · 3

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Robust energy storage density and negative capacitance in antiferroelectric heterostructures grown by atomic layer epitaxy

2024 · Yu-Sen Jiang, Yi-Hsuan Chao, et al. · Journal of Materials Chemistry A · 3

Influence of Thermally Grown Oxide Dynamic Growth Mode and Creep Strength on the Delamination and Failure of Thermal Barrier Coatings in the Furnace Cycle

2025 · Bing-Bing Liu, Xue-Shi Zhuo, et al. · Coatings · 1

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Alternating multi-pulse atomic layer deposition for dopant tailoring in sub-10 nm ferroelectric thin films

2024 · Ting-Yun Wang, Chun-Ho Chuang, et al. · Materials Today Chemistry · 1

Dynamic Thermal Evolution and Damage Failure in Plasma-Sprayed Thermal Barrier Coatings During a Burner Cycle Test: Roles of Intrinsic Cracks and Pore Defects

2026 · Xiaofei Xu, Bingbing Liu, et al. · Coatings

Low-Temperature Epitaxial Growth of GaN by Chemical-Dynamics-Manipulated Atomic Layer Epitaxy with Decoupled H2 Plasma Activation

2026 · Guan-Cheng Huang, Chi-Lin Mo, et al. · Chemistry of Materials

Author response for "Robust energy storage density and negative capacitance in antiferroelectric heterostructures grown by atomic layer epitaxy"

2024 · Yu-Sen Jiang, Yi-Hsuan Chao, et al. · Publons reviews and discussion

Works count: 23

Citation count: 319

H-index: 10

I10-index: 10