Author

Yongkang Cao

Institutions: Jiangsu Normal University, Shanghai Jiao Tong University

Observed institutions: Jiangsu Normal University, Shanghai Jiao Tong University, Chinese Academy of Sciences, China University of Petroleum, Beijing, Institute of Process Engineering, State Key Laboratory of Multiphase Complex Systems

ORCID: 0009-0001-8868-3605

Observed ORCID: 0009-0001-8868-3605

OpenAlex ID: A5072042955

Protic ionic liquid‐based deep eutectic solvents with multiple hydrogen bonding sites for efficient absorption of NH3

2020 · Yongkang Cao, Xiangping Zhang, et al. · AIChE Journal · 69

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Ionic liquid–based green processes for ammonia separation and recovery

2020 · Shaojuan Zeng, Yongkang Cao, et al. · Current Opinion in Green and Sustainable Chemistry · 49

High-mobility and low-roughness IGZO thin films deposited by ion beam deposition

2025 · Zhaoyang Chen, Jiacheng Wang, et al. · Optical Materials · 4

Development of a low-damage atomic layer etching system for SiC with high precision and enhanced surface quality

2026 · Zijing Zhang, Yongkang Cao, et al. · Results in Engineering · 2

Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

2025 · Jiacheng Wang, Yongkang Cao, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2

A novel chemically bonded phosphate ceramics derived from metakaolin and monocalcium phosphate monohydrate for restoration of stone relics

2025 · Shu Jiang, Jinhua Wang, et al. · Applied Clay Science · 2

Role of metakaolin properties in reactive aluminum availability and reaction behavior of metakaolin–monocalcium phosphate monohydrate binders

2026 · Shu Jiang, Ximo Wang, et al. · Applied Clay Science

Manufacturing of mm 2 -Level Large Scale Glass-Based Silicon Thin-Film Coupon Enabled by Transfer Printing Method

2025 · Hao Duan, Yongkang Cao, et al. · IEEE Optoelectronics Global Conference (OGC)

Self-limiting continuous atomic layer etching of SiC in Cl2/Ar plasma: Mechanism and plasma damage recovery

2025 · Zijing Zhang, Yongkang Cao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

ALE Like Post-ETCH SiC Surface Treatment

2025 · Yongkang Cao, Jian Liu, et al. · China Semiconductor Technology International Conference (CSTIC)

Works count: 10

Citation count: 128

H-index: 3

I10-index: 2