Author

Hyeongjun Kim

Observed names: H. Kim, Jonghyun Kim, 김형준

Institution: Soongsil University

Observed institutions: Pohang University of Science and Technology, Soongsil University, Sejong University, Myongji University

ORCID: 0009-0003-9136-6349

Observed ORCID: 0009-0003-9136-6349

OpenAlex ID: A5072468365

ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor

2007 · S.J. Lim, Soonju Kwon, et al. · Thin Solid Films · 160

Improvement of Interfacial Stability in ZrO2/TiN Capacitors during Crystallization Annealing Using TiO2 Interlayer by Atomic Layer Deposition

2026 · Hyeongjun Kim, Seokho Cho, et al. · SSRN Electronic Journal

Atomic layer deposition of Al2O3 thin films using trimethylaluminum and acetone

2025 · Yeji Lee, Daeun Lim, et al. · Applied Surface Science

Works count: 72

Citation count: 160

H-index: 1

I10-index: 1