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Fumihiko Hirose

Observed names: F Hirose, F. Hirose, Fumihiko HIROSE, Fumihiko, HIROSE, Hirose Fumihiko, Hirose, F, Hirose, Fumihiko, 広瀬文彦, 廣瀬 文彦, 廣瀬, 文彦, 廣瀬文彦, 文彦 広瀬, 文彦 廣瀬
Institution: Yamagata University
Observed institutions: Yamagata University, Mitsubishi Group (Japan), Tohoku University, Japan Science and Technology Agency, Mitsubishi Heavy Industries (Japan), Centre de Recherche en Économie et Statistique, Research Institute of Electrical Communication, Tohoku University
ORCID: 0000-0001-9354-2850
Observed ORCID: 0000-0001-9354-2850
OpenAlex ID: A5073937959
Starch‐based biocomposite films reinforced with cellulose nanocrystals from garlic stalks
2013 · Melissa B. Agustin, Bashir Ahmmad, et al. · Polymer Composites · 97
Infrared Study of Tris(dimethylamino)silane Adsorption and Ozone Irradiation on Si(100) Surfaces for ALD of SiO[sub 2]
2007 · Yuta Kinoshita, Fumihiko Hirose, et al. · Electrochemical and Solid-State Letters · 48
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UV Treatment Effect on TiO[sub 2] Electrodes in Dye-Sensitized Solar Cells with N719 Sensitizer Investigated by Infrared Absorption Spectroscopy
2008 · Fumihiko Hirose, Koei Kuribayashi, et al. · Electrochemical and Solid-State Letters · 46
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High Quality Silicon Epitaxy at 500°C using Silane Gas-Source Molecular Beam Technique
1989 · Fumihiko Hirose, Maki Suemitsu, et al. · Japanese Journal of Applied Physics · 46
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Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment
2010 · F. Hirose, Y. Kinoshita, et al. · Thin Solid Films · 45
Simple top-down preparation of magnetic Bi 0.9 Gd 0.1 Fe 1−x Ti x O 3 nanoparticles by ultrasonication of multiferroic bulk material
2014 · M. A. Basith, D.-T. Ngo, et al. · Nanoscale · 41
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Surface Hydrogen Desorption as a Rate-Limiting Process in Silane Gas-Source Molecular Beam Epitaxy
1990 · Fumihiko Hirose, Maki Suemitsu, et al. · Japanese Journal of Applied Physics · 40
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Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor
2012 · M. Degai, K. Kanomata, et al. · Thin Solid Films · 39
Infrared study on room-temperature atomic layer deposition of TiO2 using tetrakis(dimethylamino)titanium and remote-plasma-excited water vapor
2014 · K. Kanomata, P. Pansila, et al. · Applied Surface Science · 37
Tunable exchange bias effect in magnetic Bi0.9Gd0.1Fe0.9Ti0.1O3 nanoparticles at temperatures up to 250 K
2015 · M. A. Basith, F. A. Khan, et al. · Journal of Applied Physics · 36
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Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
2016 · K. Kanomata, K. Tokoro, et al. · Applied Surface Science · 32
IR Study on N719 Dye Adsorption with High Temperature Dye Solution for Highly Efficient Dye-Sensitized Solar Cells
2010 · F. Hirose, M. Shikaku, et al. · Journal of The Electrochemical Society · 29
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Silane gas-source atomic layer epitaxy
1992 · Fumihiko Hirose, Maki Suemitsu, et al. · Applied Surface Science · 27
Silane adsorption on Si(001)2×1
1991 · Fumihiko Hirose, Maki Suemitsu, et al. · Journal of Applied Physics · 27
Adsorption Density Control of N719 on TiO[sub 2] Electrodes for Highly Efficient Dye-Sensitized Solar Cells
2009 · Fumihiko Hirose, Koei Kuribayashi, et al. · Journal of The Electrochemical Society · 24
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Growth kinetics in silane gas-source molecular beam epitaxy
1990 · Maki Suemitsu, Fumihiko Hirose, et al. · Journal of Crystal Growth · 24
Oxygen vacancy mediated room-temperature ferromagnetism and band gap narrowing in DyFe 0.5 Cr 0.5 O 3 nanoparticles
2021 · Rana Hossain, Areef Billah, et al. · Dalton Transactions · 20
Large difference between the magnetic properties of Ba and Ti co-doped BiFeO 3 bulk materials and their corresponding nanoparticles prepared by ultrasonication
2016 · Bashir Ahmmad, Kensaku Kanomata, et al. · Journal of Physics D Applied Physics · 20
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In Situ Observation of N719 on TiO[sub 2] in Dye-Sensitized Solar Cells by IR Absorption Spectroscopy
2009 · Fumihiko Hirose, Koei Kuribayashi, et al. · Electrochemical and Solid-State Letters · 20
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Reduction of Surface Resistance of ErBa2Cu3O7-δFilms by BaZrO3Nano-Particle Inclusion
2004 · Masashi Mukaida, Masashi Ito, et al. · Japanese Journal of Applied Physics · 20
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Adsorption mechanisms of Si2H6 and GeH4 on Si(100)2 × 1 surfaces
1996 · F. Hirose, H. Sakamoto · Applied Surface Science · 20
Effects of interfacial oxide layer in P3HT/n-Si organic/inorganic heterojunction diodes on their carrier transport properties
2012 · Naoki Oyama, Sho Kaneko, et al. · Microelectronic Engineering · 19
Low-Temperature Si Selective Epitaxial Growth Using Electron-Beam-Induced Reaction
1995 · Fumihiko Hirose, Hitoshi Sakamoto Hitoshi Sakamoto · Japanese Journal of Applied Physics · 19
Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
2015 · P. Pansila, K. Kanomata, et al. · Applied Surface Science · 18
IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor
2012 · F. Hirose, Y. Kinoshita, et al. · Applied Surface Science · 18
Works count: 465
Citation count: 1,459
H-index: 20
I10-index: 45
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