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Holger Sailer

Observed names: H SAILER, H. Sailer
ORCID: 0000-0001-6035-5776
Observed ORCID: 0000-0001-6035-5776
OpenAlex ID: A5074411703
Low-Power Organic Light Sensor Array Based on Active-Matrix Common-Gate Transimpedance Amplifier on Foil for Imaging Applications
2020 · Samar Elsaegh, Clemens Veit, et al. · IEEE Journal of Solid-State Circuits · 42
Adaptive Layout Technique for Microhybrid Integration of Chip-Film Patch
2018 · Golzar Alavi, Holger Sailer, et al. · IEEE Transactions on Components Packaging and Manufacturing Technology · 24
Evaluation of calixarene—derivatives as high-resolution negative tone electron-beam resists
2002 · H. Sailer, A. Ruderisch, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 17
Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
2008 · Katja Keil, Kang-Hoon Choi, et al. · Microelectronic Engineering · 14
Adjustable sidewall slopes by electron-beam exposure layout
2017 · Corinna Kaspar, Jörg Butschke, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 13
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A chemically amplified calix649arene-based electron-beam resist
2004 · H SAILER · Microelectronic Engineering · 11
Optimized adaptive layout technique for hybrid systems in foil
2017 · Golzar Alavi, Joachim N. Burghartz, et al. · European Microelectronics and Packaging Conference · 8
Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write
2009 · Elmar Platzgummer, Christof Klein, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
High resolution nanoimprint templates for dual damascene: fabrication and imprint results
2008 · Mathias Irmscher, Joerg Butschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
EUVL mask manufacturing: technologies and results
2005 · Florian Letzkus, Joerg Butschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
High resolution electron beam lithography using a chemically amplified calix[4]arene based resist
2004 · H. Sailer, A. Ruderisch, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6
Studies on sensitivity and etching resistance of calix[4]arene derivatives as negative tone electron beam resists
2003 · A. Ruderisch, H. Sailer, et al. · Microelectronic Engineering · 5
Micro-hybrid system in polymer foil based on adaptive layout
2016 · G. Alavi, H. Sailer, et al. · Electronic System-Integration Technology Conference (ESTC) · 4
E-beam GIDC resolution enhancement technology in practical applications
2013 · S. Martens, J. Butschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
3D template fabrication process for the dual damascene NIL approach
2007 · Joerg Butschke, Mathias Irmscher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Advanced patterning strategies for maskless laser direct write lithography
2024 · Matthias Wahl, Jeff Michelmann, et al. · SPIE Novel Patterning Technologies · 3
Inspection and repair for imprint lithography at 32 nm and below
2009 · Kosta Selinidis, Ecron Thompson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Evaluation of e-beam repair for nanoimprint templates
2008 · Marcus Pritschow, Volker Boegli, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer
2006 · Anatol Schwersenz, Dirk Beyer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Universal approach for process optimization of chemically amplified photoresists in electron beam lithography
2024 · Markus Greul, Astrit Shoshi, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
Novel method to find the best process point in e-beam mask making
2021 · Ulrich Hofmann, Holger Sailer, et al. · Photomask and next-generation lithography mask technology. Conference · 2
Multidimensional process optimization of a negative e-beam photoresist for silicon-waveguide manufacturing
2021 · Markus Greul, Holger Sailer, et al. · Advances in Patterning Materials and Processes · 2
Towards Commercially Available Quartz Calibration Substrates
2020 · Luca Galatro, Carmine De Martino, et al. · ARFTG Microwave Measurement Conference · 2
Go proton: investigation on mask patterning for the 22nm hp node using a ML2 multibeam system
2009 · Joerg Butschke, Mathias Irmscher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Evaluierung hochauflösender, nicht polymerer Elektronenstrahllacke auf Calixaren-Basis
2007 · Holger Sailer · 2
Works count: 40
Citation count: 207
H-index: 8
I10-index: 6
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