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Kostas Sarakinos
Observed names:
K Sarakinos,
K. Sarakinos,
Sarakinos Kostas,
Sarakinos, K.,
Sarakinos, Kostas
Institutions:
University of Helsinki,
Helsinki Institute of Physics,
KTH Royal Institute of Technology
Observed institutions:
Linköping University,
University of Helsinki,
Aristotle University of Thessaloniki,
Helsinki Institute of Physics,
KTH Royal Institute of Technology,
RWTH Aachen University
show all 6
ORCID:
0000-0003-2864-9509
Observed ORCID:
0000-0003-2864-9509
OpenAlex ID:
A5075325186
Works
116
Awards
1
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
2009
·
K. Sarakinos
, J. Alami
, et al.
·
Surface and Coatings Technology
·
1,123
An introduction to thin film processing using high-power impulse magnetron sputtering
2012
·
Daniel Lundin
, Kostas Sarakinos
·
Journal of materials research/Pratt's guide to venture capital sources
·
316
On the deposition rate in a high power pulsed magnetron sputtering discharge
2006
·
J. Alami
, K. Sarakinos
, et al.
·
Applied Physics Letters
·
168
PDF
On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
2008
·
J Alami
, K Sarakinos
, et al.
·
Journal of Physics D Applied Physics
·
151
PDF
High power pulsed magnetron sputtering: Fundamentals and applications
2008
·
J. Alami
, S. Bolz
, et al.
·
Journal of Alloys and Compounds
·
148
Process characteristics and film properties upon growth of TiOxfilms by high power pulsed magnetron sputtering
2007
·
K Sarakinos
, J Alami
, et al.
·
Journal of Physics D Applied Physics
·
132
A strategy for increased carbon ionization in magnetron sputtering discharges
2012
·
Asim Aijaz
, Kostas Sarakinos
, et al.
·
Diamond and Related Materials
·
119
Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films
2011
·
K. Sarakinos
, A. Braun
, et al.
·
Surface and Coatings Technology
·
115
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
2011
·
Montri Aiempanakit
, Tomáš Kubart
, et al.
·
Thin Solid Films
·
100
Atom insertion into grain boundaries and stress generation in physically vapor deposited films
2013
·
D. Magnfält
, G. Abadias
, et al.
·
Applied Physics Letters
·
92
A kinetic model for stress generation in thin films grown from energetic vapor fluxes
2016
·
E. Chason
, M. Karlson
, et al.
·
Journal of Applied Physics
·
91
PDF
Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
2008
·
K. Sarakinos
, J. Alami
, et al.
·
Surface and Coatings Technology
·
81
Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
2011
·
Mattias Samuelsson
, Kostas Sarakinos
, et al.
·
Surface and Coatings Technology
·
68
Atomic-scale diffusion rates during growth of thin metal films on weakly-interacting substrates
2019
·
A. Jamnig
, D. G. Sangiovanni
, et al.
·
Scientific Reports
·
67
PDF
On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering
2009
·
J Alami
, K Sarakinos
, et al.
·
Journal of Physics D Applied Physics
·
66
PDF
Compressive intrinsic stress originates in the grain boundaries of dense refractory polycrystalline thin films
2016
·
D. Magnfält
, A. Fillon
, et al.
·
Journal of Applied Physics
·
61
3D-to-2D Morphology Manipulation of Sputter-Deposited Nanoscale Silver Films on Weakly Interacting Substrates via Selective Nitrogen Deployment for Multifunctional Metal Contacts
2020
·
Andreas Jamnig
, Nikolaos Pliatsikas
, et al.
·
ACS Applied Nano Materials
·
56
Unravelling the physical mechanisms that determine microstructural evolution of ultrathin Volmer-Weber films
2014
·
V. Elofsson
, B. Lü
, et al.
·
Journal of Applied Physics
·
52
Formation and morphological evolution of self-similar 3D nanostructures on weakly interacting substrates
2018
·
B. Lü
, G. A. Almyras
, et al.
·
Physical Review Materials
·
50
PDF
A review on morphological evolution of thin metal films on weakly-interacting substrates
2019
·
K. Sarakinos
·
Thin Solid Films
·
44
Influence of ionization degree on film properties when using high power impulse magnetron sputtering
2012
·
Mattias Samuelsson
, Daniel Lundin
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
43
In Situ and Real-Time Nanoscale Monitoring of Ultra-Thin Metal Film Growth Using Optical and Electrical Diagnostic Tools
2020
·
Jonathan Colin
, Andreas Jamnig
, et al.
·
Nanomaterials
·
40
Ionized physical vapor deposited Al2O3films: Does subplantation favor formation of α‐Al2O3?
2010
·
K. Sarakinos
, D. Music
, et al.
·
physica status solidi (RRL) - Rapid Research Letters
·
39
Dynamic competition between island growth and coalescence in metal-on-insulator deposition
2014
·
B. Lü
, V. Elofsson
, et al.
·
Applied Physics Letters
·
38
Ab initio molecular dynamics of Al irradiation-induced processes during Al2O3 growth
2011
·
Denis Music
, Farwah Nahif
, et al.
·
Applied Physics Letters
·
37
PDF
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Works count:
116
Citation count:
4,247
H-index:
32
I10-index:
60
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