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Kenya Nishio
Observed name:
Kenya NISHIO
Institution:
Sony Semiconductor Solutions Corporation (Japan)
Observed institutions:
Shizuoka University,
University of Shizuoka,
Sony Semiconductor Solutions Corporation (Japan)
OpenAlex ID:
A5075671017
Development of face-to-face and face-to-back ultra-fine pitch Cu-Cu hybrid bonding
2022
·
Yoshihisa Kagawa
, Takumi Kamibayashi
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
75
Measurement of the Frictional Force between PVA Roller Brushes and Semiconductor Wafers with Various Films Immersed in Chemicals
2016
·
Kenya Nishio
, Toshiyuki Sanada
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
7
Normal force and behavior of containing water during the compression of PVA brush
2015
·
Kenya Nishio
, Toshiyuki Sanada
, et al.
·
3
Analysis of Surface Reaction for Group III-V Compound Semiconductors in Functional Water
2021
·
Kenya Nishio
, Takashi Oinoue
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
1
Effect of WET treatment on Group III-V Compound Semiconductor Surface
2018
·
Kenya Nishio
, Suguru Saito
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
1
Measurements of normal and friction forces during brush scrubbing
2014
·
Kenya Nishio
, Toshiyuki Sanada
, et al.
·
International Conference on Planarization/CMP Technology (ICPT)
·
1
Analysis of IGZO Surface Morphology Following Wet Etching
2026
·
Kazuki Oshima
, Tomoki Hirano
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Characterization of Wet Chemical Atomic Layer Etching of InGaAs
2021
·
Tomoki Hirano
, Kenya Nishio
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Consideration of surface reaction mechanism for III V compound semiconductor in water
2019
·
Kenya Nishio
, Takashi Oinoue
, et al.
·
The Japan Society of Applied Physics
Observation of gas-liquid-solid interface using total reflection microscope with polarization plate
2016
·
Kenya NISHIO
, Toshiyuki SANADA
, et al.
·
Ryuutai Kougaku Bumon Kouenkai kouen rombunshuu/Ryutai Kogaku Bumon Koenkai koen ronbunshu
PDF
OS0107 Measurement of the friction force between PVA roller brushes and semiconductor wafers with various films in chemicals
2016
·
Kenya NISHIO
, Toshiyuki SANADA
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Relationship between friction force and water behavior of PVA roller brushes on plates with different surface wettability
2015
·
Kenya Nishio
·
The Japan Society of Applied Physics
10107 Influence of surface wettability on the friction of PVA roller brushes
2015
·
Kenya NISHIO
, YOSHITAKA Hara
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
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Works count:
13
Citation count:
88
H-index:
3
I10-index:
1
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