Get started
Author

Hitoshi Yamano

Ionic Liquid for Directed Self-Assembly of PS-b-PMMA
2016 · Akiya Kawaue, Tasuku Matsumiya, et al. · Journal of Photopolymer Science and Technology · 2
PDF
Predicting and considering properties of general polymers using incomplete dataset
2020 · Hitoshi Yamano, Hiroaki Shimizu, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 1
Neutral Layer Material Filtration for Directed Self Assembly Lithography
2016 · Toru Umeda, Tasuku Matsumiya, et al. · Journal of Photopolymer Science and Technology · 1
PDF
Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers
2016 · Tsukasa Azuma, Yuriko Seino, et al. · Journal of Photopolymer Science and Technology · 1
PDF
Block co-polymer approach for CD uniformity and placement error improvement in DSA hole grapho-epitaxy process
2015 · Tasuku Matsumiya, Tsuyoshi Kurosawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Data-science for Estimating Various Properties of Polymers Based on Monomer Unit Structure Information
2021 · Hitoshi Yamano · Institutional Repositories DataBase (IRDB)
PDF
[Special Issue for Honor Award dedicating to Prof Kimito Funatsu]Relationships of Polymer Properties and Predicting Polymer Properties Based on Monomer Structure Information
2019 · Hitoshi Yamano, Tomoyuki Miyao, et al. · Journal of Computer Aided Chemistry
PDF
Resin Composition for Forming a Phase-separated Structure, and Method of Producing Structure Containing Phase-separated Structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Grapho-epitaxial sub-10nm line and space patterning using lamellar-forming Si-containing block copolymer
2016 · Hironobu Sato, Yusuke Kasahara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Sub-10nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers
2016 · Yuriko Seino, Hironobu Sato, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Directed self-assembly of Si-containing and topcoat free block copolymer
2016 · Tasuku Matsumiya, Takehiro Seshimo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography
2016 · Yusuke Kasahara, Yuriko Seino, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Resin Composition for Forming a Phase-Separated Structure, and Method of Producing Structure Containing Phase-Separated Structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Resin Composition for Forming a Phase-separated Structure, and Method of Producing Structure Containing Phase-separated Structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
2016 · Kawaue, Akiya, Seshimo, Takehiro, et al. · University of Chicago
Works count: 17
Citation count: 6
H-index: 1
I10-index:
Year
Topic
Type