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Author

Anuja De Silva

Observed institution: Lam Research (United States)
ORCID: 0000-0003-2639-7870
Observed ORCID: 0000-0003-2639-7870
OpenAlex ID: A5081311677
Dry Deposition and Dry Development of Metal Oxide Based Photoresist
2024 · Nizan Kenane, Anuja De Silva, et al. · Journal of Photopolymer Science and Technology · 16
Achieving zero EUV patterning defect with dry photoresist system
2022 · Mohammed Alvi, Richard Gottscho, et al. · Advances in Patterning Materials and Processes · 10
Dry resist metrology readiness for high-NA EUVL
2023 · Gian Francesco Lorusso, Dieter Van Den Heuvel, et al. · Metrology, Inspection, and Process Control XXXVI · 6
Resolution improvement and dose reduction in logic and memory applications from low NA to high NA
2025 · Shubhankar Das, Victor M. Blanco Carballo, et al. · SPIE Optical and EUV Nanolithography · 4
Dry resist process development toward depth of focus improvement in high NA EUV lithography
2026 · Ching-Chung Huang, Ali Haider, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3
OPC and modeling solution to support 0.55 NA EUV stitching
2025 · Dongbo Xu, Qinglin Zeng, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
OPC model accuracy of dry resist readiness for 0.55NA EUVL by using low-n bright field mask
2025 · Dongbo Xu, Werner Gillijns, et al. · DTCO and Computational Patterning · 1
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
2023 · Mohamed Zidan, Gian Francesco Lorusso, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 1
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Monotonic machine learning (MML) for curvilinear OPC retargeting in NA0.33 EUV single-patterning 28nm metal pitch curvilinear logic technology
2026 · Hongming Zhang, Renyang Meng, et al. · SPIE Optical and EUV Nanolithography
Works count: 9
Citation count: 43
H-index: 4
I10-index: 2
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