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Author

Nick I. Pellens

Observed names: Nick Pellens, Pellens, Nick
Institution: IMEC
Observed institutions: IMEC, KU Leuven
ORCID: 0000-0001-5527-5130
Observed ORCID: 0000-0001-5527-5130
OpenAlex ID: A5083637735
Ion-Pairs in Aluminosilicate-Alkali Synthesis Liquids Determine the Aluminum Content and Topology of Crystallizing Zeolites
2022 · Karel Asselman, Nick Pellens, et al. · Chemistry of Materials · 42
Understanding crystal nucleation mechanisms: where do we stand? General discussion
2022 · Michael W. Anderson, Matthew Bennett, et al. · Faraday Discussions · 36
Structural Aspects Affecting Phase Selection in Inorganic Zeolite Synthesis
2022 · Karel Asselman, Dries Vandenabeele, et al. · Chemistry of Materials · 35
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Nucleation of Porous Crystals from Ion-Paired Prenucleation Clusters
2022 · Nick Pellens, Nikolaus Doppelhammer, et al. · Chemistry of Materials · 29
Super-ions of sodium cations with hydrated hydroxide anions: inorganic structure-directing agents in zeolite synthesis
2021 · Karel Asselman, Nick Pellens, et al. · Materials Horizons · 27
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A zeolite crystallisation model confirmed by in situ observation
2021 · Nick Pellens, Nikolaus Doppelhammer, et al. · Faraday Discussions · 23
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Generation and Observation of Long-Lasting and Self-Sustaining Marangoni Flow
2023 · Nikolaus Doppelhammer, Stefan Puttinger, et al. · Langmuir · 17
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Moving Electrode Impedance Spectroscopy for Accurate Conductivity Measurements of Corrosive Ionic Media
2020 · Nikolaus Doppelhammer, Nick Pellens, et al. · ACS Sensors · 15
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HSIL-Based Synthesis of Ultracrystalline K,Na-JBW, a Zeolite Exhibiting Exceptional Framework Ordering and Flexibility
2022 · Karel Asselman, Sambhu Radhakrishnan, et al. · Chemistry of Materials · 13
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Mask innovations on the eve of high NA EUV lithography
2024 · Vicky Philipsen, Andreas Frommhold, et al. · Japanese Journal of Applied Physics · 12
Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study
2025 · Vincent Wiaux, Natalia V. Davydova, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 9
Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization
2024 · Nick Pellens, Vicky Philipsen, et al. · International Conference on Extreme Ultraviolet Lithography · 8
Using Moving Electrode Impedance Spectroscopy to Monitor Particle Sedimentation
2020 · Nikolaus Doppelhammer, Nick Pellens, et al. · IEEE Sensors Journal · 8
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An experimental stitching study on the eve of high-NA EUV
2024 · Vincent J. Wiaux, Natalia Davydova, et al. · SPIE Optical and EUV Nanolithography · 5
Monitoring Zeolite Formation with Moving Electrode Conductometry
2021 · Nikolaus Doppelhammer, Nick Pellens, et al. · Proceedings of IEEE Sensors/Proceedings of IEEE Sensors ... · 4
Imaging evaluation of low reflectivity low-n EUV mask for LS at 0.33NA
2024 · Tatiana Kovalevich, Nick Pellens, et al. · Photomask and next-generation lithography mask technology. Conference · 3
High NA EUV stitching: mask performance is a key
2024 · Natalia V. Davydova, Vincent Wiaux, et al. · Photomask and next-generation lithography mask technology. Conference · 3
Stitching for high-NA: zooming in on CDU budget
2023 · Natalia V. Davydova, Lieve van Look, et al. · International Conference on Extreme Ultraviolet Lithography · 3
Stitching at high-NA EUV: a first experimental study
2025 · Vincent Wiaux, Natalia Davydova, et al. · International Conference on Extreme Ultraviolet Lithography · 2
The performance evaluation of at-resolution stitching on NXE
2025 · Airat Galiullin, Nick Pellens, et al. · European Mask and Lithography Conference (EMLC) · 2
Methodology of stitching evaluation at NA 0.33 to enable high-NA assessment
2025 · Ataklti Weldeslassie, Airat Galiullin, et al. · European Mask and Lithography Conference (EMLC) · 2
Imaging roadmap for high-NA EUV: paving the way to single-patterning of metal logic for future nodes
2026 · Nick Pellens, Joern-Holger Franke, et al. · SPIE Optical and EUV Nanolithography · 1
At-resolution stitching with high-reflectivity low-n masks
2025 · Nick Pellens, Vincent Wiaux, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 1
High-NA EUV single patterning of advanced metal logic nodes: inverse lithography techniques in combination with alternative mask absorbers
2024 · Ana-Maria Armeanu, Nick Pellens, et al. · European Mask and Lithography Conference (EMLC) · 1
Monitoring Particle Sedimentation in Conductive Suspensions with Moving Electrode Impedance Spectroscopy
2019 · Nikolaus Doppelhammer, Nick Pellens, et al. · Proceedings of IEEE Sensors/Proceedings of IEEE Sensors ... · 1
Works count: 34
Citation count: 302
H-index: 10
I10-index: 10
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