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Mingmei Wang
Observed name:
M.F. Wang
Institution:
Lam Research (United States)
Observed institutions:
Lam Research (Austria),
Lam Research (United States)
ORCID:
0000-0002-9043-1351
Observed ORCID:
0000-0002-9043-1351
OpenAlex ID:
A5083830338
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
2024
·
Thorsten Lill
, Mingmei Wang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
44
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
2025
·
Xue Wang
, Md Tanzid Hossain
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
11
Temperature dependence of the growth per cycle during molecular layer deposition of polyurea on plasma deposited SiO2
2026
·
Wallis E. Scholl
, Mingmei Wang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
2
Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride
2026
·
Yichen Fan
, Thorsten Lill
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
1
Polyurea films deposited by molecular layer deposition for surface and sidewall passivation during HF plasma etching of high-aspect-ratio structures
2026
·
Wallis E. Scholl
, Xue Wang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Detection of silicon-containing etch products during SiN x etching in a hydrogen fluoride plasma using quadrupole mass spectrometry
2026
·
Xue Wang
, Md Tanzid Hossain
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Cryogenic etching and halogens
2026
·
Mingmei Wang
, Yichen Fan
, et al.
·
Advanced Etch Technology and Process Integration for Nanopatterning
Modeling insights into amorphous carbon etching by SO2/O2 low-pressure plasma
2026
·
Dmitry Levko
, Mingmei Wang
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
New Developments in High Aspect Ratio Etching of 3D Memory Devices
2025
·
Thorsten Lill
, Mingmei Wang
, et al.
·
ECS Meeting Abstracts
(Invited) Recent Progress in High Aspect Ratio Etching of 3D Memory Devices
2025
·
Thorsten Lill
, Mingmei Wang
, et al.
·
ECS Meeting Abstracts
Effects of Base Oxide and Silicon Composition on Charge Trapping in HfSiO/SiO2 High-k Gate Stacks
2004
·
W.H. Wu
, M.C. Chen
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
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Works count:
11
Citation count:
58
H-index:
2
I10-index:
2
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