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Author

Hyeokjun You

Institution: Sogang University
Observed institution: Sogang University
ORCID: 0009-0003-0369-9232
Observed ORCID: 0009-0003-0369-9232
OpenAlex ID: A5084135392
Improved AC Drain Bias Stability in In–Zn–O TFTs with an Hf-Doped Heterobilayer Structure
2025 · Hyunjeong Doh, Hyeokjun You, et al. · ACS Applied Materials & Interfaces · 7
Vertical Ferroelectric–Metal Field-Effect Transistor (V-FeMFET) With Channel-All-Around (CAA) Structure
2026 · Heebum Kang, Seungmin Kang, et al. · IEEE Transactions on Electron Devices · 2
Innovative 3-D n-Capacitor-Stacked FeRAM With V DD /3 Inhibition Scheme and Cell Design for Nonvolatile DRAM Applications
2025 · Kihoon Kim, Hyeokjun You, et al. · IEEE Transactions on Electron Devices · 2
Works count: 3
Citation count: 11
H-index: 2
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