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Deog-Bae Kim
Observed names:
Deogbae Kim,
Jeong-Sik Kim
Institution:
Seoul National University
Observed institutions:
Seoul National University,
Samsung Electronics (South Korea),
AGC Seimi Chemical Co., Ltd. (Japan)
OpenAlex ID:
A5084671250
Synthesis of ArF photoresist polymer composed of three methacrylate monomers via reversible addition-fragmentation chain transfer (RAFT) polymerization
2011
·
Hae-Sung Sohn
, Sang-Ho Cha
, et al.
·
Macromolecular Research
·
42
Void-free filling of spin-on dielectric in 22nm wide ultrahigh aspect ratio Si trenches
2009
·
Krutarth Trivedi
, Carlo Floresca
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
10
Effect of deprotection activation energy on lithographic performance of EUVL resist
2007
·
Sang-Jeoung Kim
, Geun-Jong Yu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Effects of quencher ability on profile in chemically amplified resist system
2003
·
Deogbae Kim
, Hyun-Jin Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
2001
·
Se-Jin Choi
, Yong-Jun Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Measurement of EUV resists performances RLS by DUV light source
2010
·
Jeongsik Kim
, Jae-Woo Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Influences of various defects on extreme ultra-violet mask
2008
·
Eun-Jin Kim
, Jee-Hye You
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Application of newly synthesized poly(hydroxystyrene-acrylate) copolymers to improve vacuum stability on E-beam resist for mask fabrication
2004
·
Dong-hwal Lee
, Sang-jung Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists
2003
·
Jae-Hyun Kang
, Seung-Keun Oh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Improvement of line edge roughness by employing new PAG
2002
·
Yang-Sook Kim
, Yun-Hyi Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Insertion effects of various acid sensitive groups into acetal-type polymer on the profile of 248-nm chemically amplified resist
2002
·
Yoon-Sik Chung
, Hyun-Jin Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform
2001
·
Keeho Kim
, Gregory M. Wells
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Influence of Defects on Top of the Absorber in Extreme Ultraviolet Lithography
2009
·
Eun-Jin Kim
, Young-Min Kang
, et al.
·
Journal of the Korean Physical Society
PDF
Analysis of molecular resist distribution in a resist film by using x-ray reflectivity
2009
·
Jeongsik Kim
, Jae-Woo Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Resist dissolution behavior according to protecting group in polymer
2006
·
Kwanghwyi Im
, Jin Jegal
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
2004
·
Jung-Woo Kim
, Eun-Kyung Son
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
PEB sensitivity variation of 193-nm resist according to activation energy of protection groups
2004
·
Seung Keun Oh
, Jong Yong Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)
2002
·
Geunsu Lee
, Keun-Kyu Kong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist
2002
·
Hyun-Jin Kim
, Yoon-Sik Chung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Development of bottom antireflective coating for high-resolution KrF lithography
2002
·
Yoon-Ho Kang
, Chang-Il Oh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists
2001
·
Hyun-Jin Kim
, Yoon-Sik Chung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Novel high-performance ArF resist for sub-100-nm lithography
2001
·
Geunsu Lee
, Cha-Won Koh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
23
Citation count:
112
H-index:
4
I10-index:
3
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