Author

Chun-Wei Huang

Institution: Feng Chia University

Observed institutions: Feng Chia University, National Changhua University of Education

ORCID: 0000-0002-3194-3365

Observed ORCID: 0000-0002-3194-3365

OpenAlex ID: A5087437392

Crucial role of interlayer distance for antiferromagnet-induced perpendicular magnetic anisotropy

2015 · Bo-Yao Wang, Po-Han Lin, et al. · Physical Review B · 20

Ultrathin W2N barrier enabling texture-engineered cobalt interconnects with enhanced electromigration reliability

2026 · Jau-Shiung Fang, Yu-Shun Chang, et al. · Journal of Alloys and Compounds

Mechanisms of resistivity minimum for thin cobalt films with enhanced bias-stressing resistance by dilute copper alloying

2026 · Jau-Shiung Fang, Jui-Cheng Chen, et al. · Materials Chemistry and Physics

Ultrathin β-Ga 2 O 3 Thin Films for Oxide Heterostructure Transistors

2026 · Cheng-Lun Hsin, En-Lin Chen, et al. · IEEE Transactions on Materials for Electron Devices

氧化對鉛奈米顆粒自發磁性之影響; The spontaneous magnetism of Pb nanoparticles by oxidation

2010 · 黃俊瑋, Chun-Wei Huang

Works count: 5

Citation count: 20

H-index: 1

I10-index: 1