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Senaka K. Kanakamedala

Observed name: Senaka Kanakamedala
Observed institution: Western Digital (United States)
ORCID: 0000-0002-4917-3936
Observed ORCID: 0000-0002-4917-3936
OpenAlex ID: A5087632895
Area selective deposition of ruthenium on 3D structures
2022 · Kartik Sondhi, Rahul Sharangpani, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 10
Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
2023 · Roshan J. Tirukkonda, Mark D. Kraman, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 6
Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks
2024 · Kartik Sondhi, Stephen Ross, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 5
Understanding 3D anisotropic reactive ion etching of oxide-metal stacks
2023 · Prafful Golani, Roshan J. Tirukkonda, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 4
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
2023 · Kartik Sondhi, Rahul Sharangpani, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 4
Dispositif De Mémoire À Trois Dimensions Avec Des Portes De Commande En Métal Et Siliciure
2017 · Senaka Kanakamedala, Raghuveer S. Makala, et al.
Works count: 6
Citation count: 29
H-index: 4
I10-index: 1
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