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Hongjun Oh
Institution:
Hongik University
Observed institution:
Hongik University
ORCID:
0000-0002-7509-262X
Observed ORCID:
0000-0002-7509-262X
OpenAlex ID:
A5088227346
Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
2021
·
Jinseon Lee
, Jeong‐Min Lee
, et al.
·
Advanced Functional Materials
·
76
Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates
2022
·
Jeong-Min Lee
, Jinseon Lee
, et al.
·
Applied Surface Science
·
38
Growth modulation of atomic layer deposition of HfO 2 by combinations of H 2 O and O 3 reactants
2021
·
Byeong Guk Ko
, Chi Thang Nguyen
, et al.
·
Dalton Transactions
·
24
Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor
2021
·
Mohd Zahid Ansari
, Petr Janicek
, et al.
·
Applied Surface Science
·
22
Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces
2024
·
Jinseon Lee
, Jieun Oh
, et al.
·
Applied Surface Science
·
19
Fluorination of TiN, TiO2, and SiO2 Surfaces by HF toward Selective Atomic Layer Etching (ALE)
2023
·
Ju Hyeon Jung
, Hongjun Oh
, et al.
·
Coatings
·
14
PDF
Reaction mechanisms of α,ω-bifunctional molecules toward atomic layer deposition versus molecular layer deposition
2024
·
Miso Kim
, Hongjun Oh
, et al.
·
Materials Chemistry and Physics
·
2
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Works count:
7
Citation count:
195
H-index:
6
I10-index:
6
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