Get started
Author

Baimei Tan

Observed names: B. M. Tan, Bai-mei TAN
Observed institution: Hebei University of Technology
ORCID: 0000-0003-3498-4143
Observed ORCID: 0000-0003-3498-4143
OpenAlex ID: A5089107807
Insights into triazole derivatives as potential corrosion inhibitors in CMP process: Experimental evaluation and theoretical analysis
2022 · Wei Li, Baimei Tan, et al. · Applied Surface Science · 125
Corrosion control of copper wiring by barrier CMP slurry containing azole inhibitor: Combination of simulation and experiment
2020 · Tengda Ma, Baimei Tan, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 90
Effect of arginine-based cleaning solution on BTA residue removal after Cu-CMP
2019 · Qi Wang, Da Yin, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 57
Theoretical and electrochemical analysis on inhibition effect of benzotriazole and 1,2,4-triazole on cobalt surface
2020 · Da Yin, Liu Yang, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 54
The effect of structural properties of benzo derivative on the inhibition performance for copper corrosion in alkaline medium: Experimental and theoretical investigations
2022 · Wei Li, Tengda Ma, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 51
Research progress on the application of ceria nanoparticles as abrasives in dielectric layer CMP and post cleaning: Structure, morphology, doping, and mechanism
2023 · Xinyu Han, Renhao Liu, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 49
A study of FTIR and XPS analysis of alkaline‐based cleaning agent for removing Cu‐BTA residue on Cu wafer
2019 · Baohong Gao, Baimei Tan, et al. · Surface and Interface Analysis · 48
Experimental and theoretical investigation on the inhibition performance of disulfide derivatives on cobalt corrosion in alkaline medium
2021 · Tengda Ma, Baimei Tan, et al. · Journal of Molecular Liquids · 46
Synergistic effect of composite complex agent on BTA removal in post CMP cleaning of copper interconnection
2020 · Da Yin, Liu Yang, et al. · Materials Chemistry and Physics · 45
Experimental validation and molecular dynamics simulation of removal of PO residue on Co surface by alkaline cleaning solution with different functional groups
2020 · Xiaoqin Sun, Shihao Zhang, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 42
Aqueous MBene-Based Electrochemical Filter Capacitors with High Frequency Response and Capacity Density
2023 · Yanjie Cheng, Zhe Li, et al. · ACS Materials Letters · 40
Method of surface treatment on sapphire substrate
2006 · Xin-huan NIU, Yu-ling LIU, et al. · Transactions of Nonferrous Metals Society of China · 37
In-depth research on azole corrosion inhibitors - effect of N atoms position and quantity on copper corrosion inhibition performance in alkaline environments: Experimental evaluation and theoretical analysis
2024 · Renhao Liu, Xinyu Han, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 36
Multidimensional insights into the corrosion inhibition of potassium oleate on Cu in alkaline medium: A combined Experimental and theoretical investigation
2021 · Tengda Ma, Baimei Tan, et al. · Materials Science and Engineering B · 36
Theoretical and electrochemical analysis on inhibition effects of benzotriazole derivatives (un- and methyl) on copper surface
2021 · Da Yin, Liu Yang, et al. · Journal of Molecular Structure · 35
The effect of amino acid addition in CeO2-based slurry on SiO2/Si3N4 CMP: Removal rate selectivity, morphology, and mechanism research
2024 · Xinyu Han, Shihao Zhang, et al. · Journal of Molecular Liquids · 34
Application of surfactant for facilitating benzotriazole removal and inhibiting copper corrosion during post-CMP cleaning
2018 · Jiying Tang, Yuling Liu, et al. · Microelectronic Engineering · 33
Study on the Adsorption and Inhibition Mechanism of 1,2,4-Triazole on Copper Surface in Copper Interconnection CMP
2019 · Qi Wang, Baimei Tan, et al. · ECS Journal of Solid State Science and Technology · 32
PDF
Corrosion inhibition effect of benzimidazole and two derivatives on copper in alkaline environments: Experimental and theoretical analyses
2023 · Xiaolong Wang, Wei Li, et al. · Journal of Molecular Liquids · 30
Nicotinic acid as a novel inhibitor for alkaline cobalt CMP: Experiment and molecular simulation
2022 · Boao Ma, Shihao Zhang, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 30
Three anionic surfactants for corrosion inhibition in cobalt CMP: Research on validity and mechanism
2024 · Fangyuan Wang, Shihao Zhang, et al. · Surfaces and Interfaces · 29
Effect of complexing agent on ceria particle removal in post-STI CMP cleaning process
2022 · Mei Yan, Baimei Tan, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 29
Effect of EDTA-based alkaline cleaning solution on TAZ removal in post CMP cleaning of copper interconnection
2021 · Da Yin, Qi Wang, et al. · Materials Research Bulletin · 29
Synergistic effect of LABSA/JFCE combined surfactant system on the removal of particles on copper wafer surface
2020 · Da Yin, Siyu Tian, et al. · Materials Chemistry and Physics · 29
Recent advances and future developments in PVA brush scrubbing cleaning: A review
2022 · Shihao Zhang, Fangyuan Wang, et al. · Materials Science in Semiconductor Processing · 27
Works count: 115
Citation count: 1,732
H-index: 26
I10-index: 51
Year
Topic
Type