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Naozumi Fujiwara

Observed name: N. Fujiwara
ORCID: 0009-0005-7570-1893
Observed ORCID: 0009-0005-7570-1893
OpenAlex ID: A5089945905
Polycrystalline n ‐ZnO/ p ‐Cu 2 O heterojunctions grown by RF‐magnetron sputtering
2004 · S. Ishizuka, K. Suzuki, et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 63
Passivation of defects in polycrystalline Cu2O thin films by hydrogen or cyanide treatment
2003 · S. Ishizuka, S. Kato, et al. · Applied Surface Science · 57
Passivation of defects in nitrogen-doped polycrystalline Cu2O thin films by crown-ether cyanide treatment
2003 · Y. Okamoto, S. Ishizuka, et al. · Applied Physics Letters · 40
In Situ Fluorescence Imaging and Time-Resolved Total Internal Reflection Fluorometry of Palladium(II)−Tetrapyridylporphine Complex Assembled at the Toluene−Water Interface
2001 · Naozumi Fujiwara, Satoshi Tsukahara, et al. · Langmuir · 35
Removal of copper and nickel contaminants from Si surface by use of cyanide solutions
2004 · N. Fujiwara, Y.-L. Liu, et al. · Applied Surface Science · 20
Silicon cleaning and defect passivation effects of hydrogen cyanide aqueous solutions
2005 · Masao Takahashi, Yueh-Ling Liu, et al. · Solid State Communications · 19
Mechanism of Copper Removal from SiO[sub 2] Surfaces by Hydrogen Cyanide Aqueous Solutions
2006 · Naozumi Fujiwara, Yueh-Ling Liu, et al. · Journal of The Electrochemical Society · 14
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Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces
2021 · Dai Ueda, Yousuke Hanawa, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 12
Breakthrough of Sublimation Drying by Liquid Phase Deposition
2021 · Yuta Sasaki, Yousuke Hanawa, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 8
A New Cleaning Technology Using the Effect of Freezing Water on Wafer Surface
2011 · Katsuhiko Miya, Naozumi Fujiwara, et al. · ECS Transactions · 7
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On a presence of SimHn clusters in a-Si:H/c-Si structures
2006 · M. Kopáni, E. Pinčík, et al. · Applied Surface Science · 7
Reaction of cyanide ions with copper on Si surfaces and its use for Si cleaning
2006 · Yueh-Ling Liu, Naozumi Fujiwara, et al. · Surface Science · 7
Passivation of Defect States in Amorphous and Crystalline Si by use of Cyanide Treatment and Improvement of Solar Cell Characteristics
2002 · Hikaru Kobayashi, Naozumi Fujiwara, et al. · MRS Proceedings · 7
Insights into FinFET Structure Collapse: A Reactive Force Field-Based Molecular Dynamics Investigation
2023 · Ryuichi Seki, Naozumi Fujiwara, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 5
Amorphous SiO2 Surface Irregularities and their Influence on Liquid Molecule Adsorption by Molecular Dynamics Analysis
2023 · Masayoshi Takayanagi, Naozumi Fujiwara, et al. · ECS Journal of Solid State Science and Technology · 5
Photoluminescence, structural and electrical properties of passivated a-Si:H based thin films and corresponding solar cells
2004 · E. Pinčı́k, H. Kobayashi, et al. · Applied Surface Science · 4
Adhesion and Elastic Energy Analysis of Pattern Collapse in Surface-Modified FinFET Structures
2025 · Ryuichi Seki, Hirofumi Tabe, et al. · ECS Journal of Solid State Science and Technology · 3
The effect of KCN passivation on IR spectra of a-Si based structures
2012 · Martin Kopani, Milan Mikula, et al. · Applied Surface Science · 3
Investigation of electrical, structural, and optical properties of very thin oxide/a-Si:H/c-Si interfaces passivated by cyanide treatment
2004 · Emil Pincik, Hikaru Kobayashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Effect of Nanoslit Width on Isopropyl Alcohol Evaporation: A Molecular Dynamics Study
2026 · Hirofumi Tabe, Ryuichi Seki, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Molecular Dynamics Study of Adhesion Energy between H-Terminated Silicon Surfaces in Liquid Environments
2026 · Hirofumi Tabe, Ryuichi Seki,, et al. · ECS Advances
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Molecular Dynamics Simulation of Calculation of Adhesion Energies
2024 · Hirofumi Tabe, Ryuichi Seki, et al. · ECS Meeting Abstracts
Verification of Adhesive Forces Reduction By Surface Modification Treatment in Finfet Patterns: A Molecular Dynamics Simulation Study
2024 · Ryuichi Seki, Hirofumi Tabe, et al. · ECS Meeting Abstracts
Extreme Chemical Reduction on Photoresist Stripping Process by Using Sulfuric Acid Ozone Mixture in Liquid Film
2024 · Tsung-Ju Lin, Yu Yamaguchi, et al. · ECS Meeting Abstracts
Extreme Chemical Reduction on Photoresist Stripping Process by Using Sulfuric Acid Ozone Mixture in Liquid Film
2024 · Tsung-Ju Lin, Yu Yamaguchi, et al. · ECS Transactions
Works count: 29
Citation count: 317
H-index: 8
I10-index: 8
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