Author

Bryan M. Cord

Observed names: B. Cord, B. M. Cord, B.M. Cord, Bryan Cord, Cord, Bryan

Observed institutions: University of Minnesota, Massachusetts Institute of Technology, University of Delaware

OpenAlex ID: A5091007530

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

2009 · Joel K. W. Yang, Bryan Cord, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 185

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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

2010 · Huigao Duan, Donald Winston, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 114

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Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

2009 · D. Winston, B. M. Cord, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 106

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Optimal temperature for development of poly(methylmethacrylate)

2007 · Bryan Cord, Jodie Lutkenhaus, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 91

Anisotropic Structure and Transport in Self-Assembled Layered Polymer−Clay Nanocomposites

2007 · Jodie L. Lutkenhaus, Elsa A. Olivetti, et al. · Langmuir · 76

Limiting factors in sub-10nm scanning-electron-beam lithography

2009 · Bryan Cord, Joel Yang, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 72

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Electron-beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in situ electron-beam-induced desorption

2010 · D. L. Olynick, B. Cord, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 68

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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale

2010 · Huigao Duan, Vitor R. Manfrinato, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 53

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Suppressed Critical Current in Superconducting Nanowire Single-Photon Detectors With High Fill-Factors

2009 · J.K.W. Yang, A.J. Kerman, et al. · IEEE Transactions on Applied Superconductivity · 28

Robust shadow-mask evaporation via lithographically controlled undercut

2006 · B. Cord, C. Dames, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 26

Miniaturization of grayscale images

2011 · Joel K. W. Yang, Huigao Duan, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 5

Achieving sub-10-nm resolution using scanning electron beam lithography

2009 · B. Cord · DSpace@MIT (Massachusetts Institute of Technology) · 3

An entangling gate for dual-rail erasure qubits

2026 · Nitish Mehta, James D. Teoh, et al. · Nature · 2

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Bias-preserving and error-detectable entangling operations in a superconducting dual-rail system

2025 · Mehta, Nitish, Teoh, James D., et al. · arXiv (Cornell University) · 2

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Development of δB/i-Si/δSb and δB/i-Si/δSb/i-Si/δB resonant interband tunnel diodes for integrated circuit applications

2002 · S.L. Rommel, Niu Jin, et al. · Conference digest · 2

Rapid fabrication of deep-submicron Josephson junctions

2004 · B. Cord · DSpace@MIT (Massachusetts Institute of Technology)