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Hwanyeol Park

Observed names: Hwanyeol PARK, Park, Hwanyeol
ORCID: 0000-0002-6259-1905
Observed ORCID: 0000-0002-6259-1905
OpenAlex ID: A5091408659
Data driven computational design of stable oxygen evolution catalysts by DFT and machine learning: Promising electrocatalysts
2024 · Hwanyeol Park, Yunseok Kim, et al. · Journal of Energy Chemistry · 69
Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules
2020 · Jeong-Min Lee, Jinseon Lee, et al. · Applied Surface Science · 41
Predictive fabrication of Ni phosphide embedded in carbon nanofibers as active and stable electrocatalysts
2019 · Ji-Yong Kim, Hwanyeol Park, et al. · Journal of Materials Chemistry A · 30
Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering
2019 · So-Yeon Lee, Kyung-Tae Jang, et al. · Carbon · 24
The influence of hydrogen concentration in amorphous carbon films on mechanical properties and fluorine penetration: a density functional theory and ab initio molecular dynamics study
2020 · Hwanyeol Park, Daekwang Woo, et al. · RSC Advances · 23
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Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas
2019 · Hwanyeol Park, Euijoon Yoon, et al. · Applied Surface Science · 23
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Accelerating hydrogen evolution catalyst discovery via data-driven strategy for high-performance single-atom catalysts embedded in h-BN
2025 · Hwanyeol Park, Dae-Myeong Geum, et al. · Journal of Energy Chemistry · 21
First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl
2019 · Hwanyeol Park, Daekwang Woo, et al. · Scientific Reports · 19
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Effects of nitrogen doping in amorphous carbon layers on the diffusion of fluorine atoms: A first-principles study
2019 · Hwanyeol Park, Sungwoo Lee, et al. · Journal of Applied Physics · 16
Effect of dilution gas on the distribution characteristics of capacitively coupled plasma by comparing SiH4/He and SiH4/Ar
2023 · Ho Jun Kim, Kyungjun Lee, et al. · Plasma Sources Science and Technology · 15
Direct observation and catalytic role of mediator atom in 2D materials
2020 · Gun-Do Lee, Alex W. Robertson, et al. · Science Advances · 15
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Room temperature operation of mid-infrared InAs081Sb019 based photovoltaic detectors with an In02Al08Sb barrier layer grown on GaAs substrates
2018 · Dae-Myeong Geum, SangHyeon Kim, et al. · Optics Express · 15
Dissociation reaction of B 2 H 6 on TiN surfaces during atomic layer deposition: first-principles study
2017 · Hwanyeol Park, Sungwoo Lee, et al. · RSC Advances · 15
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Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study
2018 · Hwanyeol Park, Sungwoo Lee, et al. · RSC Advances · 14
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Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors
2023 · Ho Jun Kim, Kyungjun Lee, et al. · Plasma Sources Science and Technology · 13
Theoretical Analysis of Si2H6 Adsorption on Hydrogenated Silicon Surfaces for Fast Deposition Using Intermediate Pressure SiH4 Capacitively Coupled Plasma
2021 · Hwanyeol Park, Ho Jun Kim · Coatings · 10
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Reaction mechanisms of chlorine reduction on hydroxylated alumina in titanium nitride growth: First principles study
2021 · Woojin Choi, Sungwoo Lee, et al. · Applied Surface Science · 8
First-Principles Investigation of Morphological Evolution of Tungsten Growth on Alumina Surfaces: Implications for Thin-Film Growth
2022 · Hwanyeol Park, Dong-Hoon Han, et al. · ACS Applied Nano Materials · 6
Effects of H 2 and N 2 treatment for B 2 H 6 dosing process on TiN surfaces during atomic layer deposition: an ab initio study
2018 · Hwanyeol Park, Sungwoo Lee, et al. · RSC Advances · 6
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Solid-Phase Epitaxial Growth of an Alumina Layer Having a Stacking-Mismatched Domain Structure of the Intermediate γ-Phase
2018 · Jeonghwan Jang, Seung-Yong Lee, et al. · ACS Applied Materials & Interfaces · 5
Suppression of surface leakage current in InSb photodiode by ZnS passivation
2016 · Sehun Park, Daehan Choi, et al. · International Journal of Nanotechnology · 5
Adsorption of silane radicals governing plasma silicon deposition with dilution gases
2025 · Hwanyeol Park, Ho Jun Kim · Physics of Fluids · 4
First-Principles computation-driven mechanism study of tungsten growth on alumina surfaces with TiN nano-islands
2024 · Woojin Choi, Sungwoo Lee, et al. · Applied Surface Science · 4
Thermodynamic insights into interfacial interactions in TiN/amorphous Al 2 O 3 heterostructures: ab initio molecular dynamics and first principles investigation
2020 · Hwanyeol Park, Dong-Hoon Han, et al. · Inorganic Chemistry Frontiers · 4
Advances in area-selective atomic layer deposition: surface chemistry, challenges, and future perspectives
2026 · Hyosik Jo, Yunseok Kim, et al. · Coordination Chemistry Reviews · 3
Works count: 42
Citation count: 413
H-index: 14
I10-index: 16
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