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S. Y. Guo
Observed names:
S.Y. Guo,
Shuwen Guo
Institutions:
Shanghai Polytechnic University,
Shanghai Jiao Tong University
Observed institutions:
Shanghai Polytechnic University,
Shanghai Jiao Tong University
ORCID:
0009-0003-2986-0389
Observed ORCID:
0009-0003-2986-0389
OpenAlex ID:
A5100998385
Transparent and semitransparent conducting film deposition by reactive-environment, hollow cathode sputtering
2005
·
A. E. Delahoy
, S. Y. Guo
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
53
Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3:Mo
2004
·
A. E. Delahoy
, S. Y. Guo
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
27
TiN and TiO2:Nb thin film preparation using hollow cathode sputtering with application to solar cells
2006
·
S. Y. Guo
, W. N. Shafarman
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
21
Textured, doped, ZnO thin films produced by a new process for a-Si and CIGS solar cell application
2007
·
S. Y. Guo
, L. Sahoo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Explicit photogain principle for polycrystalline nanowire photoconductors
2025
·
Shuwen Guo
, Huan Liu
, et al.
·
Applied Physics Reviews
·
3
Deposition of large area, directly textured, ZnO:Al films by reactive-environment, hollow cathode sputtering
2008
·
A.M. Patel
, S.Y. Guo
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
2
An engineered metal-to-insulator transition in a two-dimensional network of degenerate phosphorus quantum dots in silicon
2026
·
Zhengfang Fan
, Yumeng Liu
, et al.
·
Applied Physics Letters
Deep-UV Imaging Based on Ultrashallow Junction Silicon Photodiode Arrays
2026
·
Shuwen Guo
, Jiajun Shen
, et al.
·
IEEE Transactions on Electron Devices
Electrical activities of sulfur dopants in GaAs introduced by self-assembled molecular monolayers
2025
·
Zhengfang Fan
, Yumeng Liu
, et al.
·
Journal of Applied Physics
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Works count:
9
Citation count:
116
H-index:
4
I10-index:
4
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