Author

Yujin Han

Institutions: Sungshin Women's University, Samsung (South Korea), Samsung Advanced Institute of Technology (South Korea)

Observed institutions: Sungshin Women's University, Samsung (South Korea), Korea University of Technology and Education, Samsung Advanced Institute of Technology (South Korea)

ORCID: 0000-0002-4085-9069

Observed ORCIDs: 0000-0002-4085-9069, 0000-0001-7166-3029

OpenAlex ID: A5101400329

Topological Semimetal MoP as Future Conductors in Back-End-of-Line: Thin Film Deposition, Resistivity Scaling, Processability, Integration, and Reliability

2026 · Keun Wook Shin, Hyangsook Lee, et al. · IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) · 2

Grain-Orientation-Engineering of Atomic Layer Deposited Ruthenium Interconnect Technology

2025 · Youngchul Leem, Eun-Hyoung Cho, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 1

High-density growth of single-crystal CoSi nanowires via plasma-driven synergistic surface engineering

2026 · Gwangsik Mun, Eugene Cho, et al. · Applied Surface Science

Temperature and chemical effects on the interfacial energy between a Ga–In–Sn eutectic liquid alloy and nanoscopic asperities

2022 · Yujin Han, Pierre-Marie Thebault, et al. · Beilstein Journal of Nanotechnology

Works count: 4

Citation count: 3

H-index: 1

I10-index: