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Jeong-Gil Kim
Observed names:
J G Kim,
J.-G. Kim,
J.G. Kim,
Jeong-gil Kim,
Jeonggil Kim,
Jeong‐Gil Kim,
김정길
show all 7
Institution:
Samsung Electronics (South Korea)
Observed institutions:
Korea Institute for Advanced Study,
Seoul National University,
Samsung (South Korea),
Samsung Advanced Institute of Technology (South Korea),
Samsung Electronics (South Korea),
Massachusetts Institute of Technology
show all 6
OpenAlex ID:
A5101478971
From Two-Dimensional Colloidal Self-Assembly to Three-Dimensional Nanolithography
2011
·
C.-H. Chang
, L. Tian
, et al.
·
Nano Letters
·
111
Multifunctional Inverted Nanocone Arrays for Non‐Wetting, Self‐Cleaning Transparent Surface with High Mechanical Robustness
2014
·
Jeong‐Gil Kim
, Hyungryul J. Choi
, et al.
·
Small
·
89
Large area pattern replication by nanoimprint lithography for LCD–TFT application
2009
·
Jeong-Gil Kim
, Youngsuk Sim
, et al.
·
Microelectronic Engineering
·
34
Nano-indentation method for the measurement of the Poisson’s ratio of MEMS thin films
2003
·
Jong-Hoon Kim
, Soon-Chang Yeon
, et al.
·
Sensors and Actuators A Physical
·
30
A tunable vibratory microgyroscope
1998
·
Y.S. Oh
, B.L. Lee
, et al.
·
Sensors and Actuators A Physical
·
26
Conical photonic crystals for enhancing light extraction efficiency from high refractive index materials
2015
·
Jeong-Gil Kim
, Chih-Hung Hsieh
, et al.
·
Optics Express
·
25
Modification of optical and mechanical surface properties of sputter-deposited aluminum thin films through ion implantation
2014
·
Tae June Kang
, Jeong-Gil Kim
, et al.
·
International Journal of Precision Engineering and Manufacturing
·
25
Development of large area nano imprint technology by step and repeat process and pattern stitching technique
2009
·
Youngtae Cho
, Sin Kwon
, et al.
·
Microelectronic Engineering
·
22
Design of Patterned Surfaces with Selective Wetting Using Nanoimprint Lithography
2010
·
Aleksander Bessonov
, Jeong‐Gil Kim
, et al.
·
Macromolecular Chemistry and Physics
·
19
Deformation characteristics of electroplated MEMS cantilever beams released by plasma ashing
2008
·
T.J. Kang
, J.G. Kim
, et al.
·
Sensors and Actuators A Physical
·
18
Control over pattern fidelity and surface wettability of imprinted templates for flexible color filter manufacturing
2011
·
Aleksander Bessonov
, Jung-Woo Seo
, et al.
·
Microelectronic Engineering
·
16
Micro Pattern Roll Mold for Large Area Display by Electroforming and Wrapping Method
2009
·
Eun-Soo Hwang
, Jung-Woo Park
, et al.
·
Japanese Journal of Applied Physics
·
15
PDF
Large Scale Production of Photonic Crystals on Scintillators
2016
·
Arno Knapitsch
, Etiennette Auffray
, et al.
·
IEEE Transactions on Nuclear Science
·
9
PDF
Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
2014
·
Sagrario Dominguez
, Ignacio Cornago
, et al.
·
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
·
8
PDF
Time-resolved measurement of radical populations in extreme-ultraviolet-light-induced hydrogen plasma
2022
·
Chang Liu
, Nozomi Tanaka
, et al.
·
Applied Physics Express
·
5
PDF
Linear μ-bending method for the measurement of the residual stress of surface-micromachined MEMS
2004
·
Jong-Hoon Kim
, Jeong-Gil Kim
, et al.
·
Sensors and Actuators A Physical
·
4
Mass replication of multifunctional surface by nanoimprint of high aspect ratio tapered nanostructures
2012
·
Jeong-Gil Kim
, Hyungryul J. Choi
, et al.
·
International Conference on Optical MEMS and Nanophotonics
·
2
Fabrication of ultra high aspect ratio silica nanocone arrays by multiple shrinking mask etching
2012
·
Hyungryul J. Choi
, Ignacio Cornago
, et al.
·
International Conference on Optical MEMS and Nanophotonics
·
2
Deformation analysis of the surface micromachined MEMS structures due to the plasma ashing process
2003
·
Jong-Hun Kim
, Geun-Cheol Hwang
, et al.
·
Journal of the Korean Society for Aeronautical & Space Sciences
·
2
PDF
Scan Speed Optimization for Wafer Exposure Time Reduction in Semiconductor Manufacturing
2024
·
Jisu Kim
, Hyeseon Kwon
, et al.
·
Annual Conference of the IEEE Industrial Electronics Society (IECON)
·
1
Fabrication of aperiodic subwavelength nanostructures by Grayscale Interference Lithography (GIL)
2013
·
Hyungryul J. Choi
, Jeong-Gil Kim
, et al.
·
IEEE International Conference on Nanotechnology (IEEE-NANO)
·
1
Nano-bending Method to Identify the Residual Stresses of MEMS Films
2003
·
Jun Hee Hahn
, J G Kim
, et al.
·
TechConnect Briefs
·
1
Sub-50 nm nanoparticle removal from EUV masks via elastomer stamp
2025
·
Hyunkoo Lee
, Youngchan Kim
, et al.
·
SPIE Photomask Technology Conference
Advanced wafer engineering for minimizing overlay: tailoring and reducing wafer stress and distortion
2024
·
Jong-Gu Lee
, Hyeon-Jin Kim
, et al.
·
DTCO and Computational Patterning
Cleaning of tin layer on EUV multilayer mirrors by the EUV induced hydrogen plasma
2021
·
Nozomi Tanaka
, Baojun Zhu
, et al.
·
The Japan Society of Applied Physics
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Works count:
34
Citation count:
465
H-index:
12
I10-index:
12
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