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Kashish Sharma

Observed names: K. Sharma, Sharma, K (Kashish), Sharma, K.
ORCID: 0000-0001-6865-2265
Observed ORCID: 0000-0001-6865-2265
OpenAlex ID: A5101718395
Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas
2016 · Nicholas R. Johnson, Huaxing Sun, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 69
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
2022 · Marc J. M. Merkx, Athanasios Angelidis, et al. · The Journal of Physical Chemistry C · 61
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Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor
2014 · Kashish Sharma, Robert A. Hall, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 51
Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
2015 · Kashish Sharma, Dmitri Routkevitch, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 43
Optical modeling of plasma-deposited ZnO films: Electron scattering at different length scales
2014 · Harm C. M. Knoops, Bas W. H. van de Loo, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 42
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Functionalization of the SiO2 Surface with Aminosilanes to Enable Area-Selective Atomic Layer Deposition of Al2O3
2022 · Wanxing Xu, Mitchel G. N. Haeve, et al. · Langmuir · 40
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2
2020 · Marc J. M. Merkx, Rick G. J. Jongen, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 36
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Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
2017 · Alexander S. Yersak, Kashish Sharma, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 28
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Novel approach to thin film polycrystalline silicon on glass
2009 · A. Illiberi, K. Sharma, et al. · Materials Letters · 28
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
2017 · Daniel J. Higgs, Jaime W. DuMont, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 26
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Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources
2019 · Wanxing Xu, Paul C. Lemaire, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 24
On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon
2011 · Kashish Sharma, Annalisa Branca, et al. · Advanced Energy Materials · 24
Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface
2021 · Wanxing Xu, Ryan J. Gasvoda, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 20
Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2
2021 · Wanxing Xu, Paul C. Lemaire, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 18
Role of a‐Si:H bulk in surface passivation of c‐Si wafers
2010 · A. Illiberi, K. Sharma, et al. · physica status solidi (RRL) - Rapid Research Letters · 16
Solid-phase crystallization of ultra high growth rate amorphous silicon films
2012 · K. Sharma, M. V. Ponomarev, et al. · Journal of Applied Physics · 11
Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer
2012 · M. V. Ponomarev, K. Sharma, et al. · Journal of Applied Physics · 11
In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers
2012 · K. Sharma, M. A. Verheijen, et al. · Journal of Applied Physics · 10
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Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells
2014 · K. Sharma, B. L. Williams, et al. · International Journal of Photoenergy · 8
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Study of the effect of boron doping on the solid phase crystallisation of hydrogenated amorphous silicon films
2014 · J.M. Westra, R.A.C.M.M. van Swaaij, et al. · Thin Solid Films · 7
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Extending growth inhibition during area-selective atomic layer deposition of Al 2 O 3 on aminosilane-functionalized SiO 2
2022 · Wanxing Xu, Paul C. Lemaire, et al. · Chemical Communications · 6
Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H
2012 · F. Law, B. Hoex, et al. · Thin Solid Films · 6
On the effect of the underlying ZnO:Al layer on the crystallization kinetics of hydrogenated amorphous silicon
2013 · K. Sharma, M. V. Ponomarev, et al. · Applied Physics Letters · 2
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Expanding Thermal Plasma deposited a-Si:H thin films for surface passivation of c-Si wafers
2010 · A. Illiberi, K. Sharma, et al. · Conference record of the IEEE Photovoltaic Specialists Conference · 1
Corrigendum #2 to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells”
2020 · K. Sharma, B. L. Williams, et al. · International Journal of Photoenergy
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Works count: 33
Citation count: 588
H-index: 15
I10-index: 18
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