Author

Jie-He Guo

Observed names: J.Q. Guo, Jiaqi Guo

Institutions: Chinese Academy of Sciences, Institute of Microelectronics, University of Chinese Academy of Sciences

Observed institutions: Chinese Academy of Sciences, Institute of Microelectronics, University of Chinese Academy of Sciences

ORCID: 0009-0000-0428-4504

Observed ORCID: 0009-0000-0428-4504

OpenAlex ID: A5101759404

Low damage atomic layer etching technology for gate recessed fabrication

2023 · J.Q. Guo, K. Wei, et al. · Vacuum · 8

Gate trench dry etching technology with damage blocking layer for GaN HEMT devices

2024 · Jiaqi Guo, Ke Wei, et al. · Vacuum · 4

Works count: 2

Citation count: 12

H-index: 2

I10-index: