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Q. Fang

Observed names: Fang Qi, Fang, Q, Fang, Q., Q Fang, Qi Fang, Qingqing Fang
Observed institutions: Oxford Instruments (United Kingdom), Anhui University, Chinese Academy of Sciences, London Centre for Nanotechnology, University of Warwick, Suzhou Institute of Nano-tech and Nano-bionics, Shanghai Institute of Microsystem and Information Technology, Institute of Solid State Physics, University College London, Imperial College London, Xi'an Jiaotong University
ORCID: 0000-0003-3393-1998
Observed ORCIDs: 0000-0003-3393-1998, 0000-0002-0045-1157, 0000-0002-3047-6216
OpenAlex ID: A5101858898
Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)
2004 · G. He, M. Liu, et al. · Surface Science · 221
Optical and electrical properties of plasma-oxidation derived HfO 2 gate dielectric films
2006 · G. He, L.Q. Zhu, et al. · Applied Surface Science · 118
Silver nanowire array infrared polarizers
2002 · Y T Pang, G W Meng, et al. · Nanotechnology · 85
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FTIR and XPS investigation of Er-doped SiO2–TiO2 films
2003 · Q. Fang, M. Meier, et al. · Materials Science and Engineering B · 77
Micro-gas-sensor with conducting polymers
2002 · Q. Fang, D.G. Chetwynd, et al. · Sensors and Actuators B Chemical · 74
Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputtering
2005 · G. He, L. D. Zhang, et al. · Applied Physics Letters · 69
Erosion of ceramic materials by a sand/water slurry jet
1999 · Q. Fang, H. Xu, et al. · Wear · 66
Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy
2006 · G. He, L. D. Zhang, et al. · Journal of Applied Physics · 63
Microstructure and optical properties of ultra-thin zirconia films prepared by nitrogen-assisted reactive magnetron sputtering
2005 · L Q Zhu, Q Fang, et al. · Nanotechnology · 59
Interface of ultrathin HfO2 films deposited by UV-photo-CVD
2004 · Q. Fang, J.-Y. Zhang, et al. · Thin Solid Films · 59
Growth of tantalum pentoxide film by pulsed laser deposition
1999 · Jun-Ying Zhang, Qi Fang, et al. · Applied Surface Science · 59
The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films
2004 · G He, Q Fang, et al. · Journal of Crystal Growth · 56
Copper nanowire arrays for infrared polarizer
2003 · Y.T. Pang, G.W. Meng, et al. · Applied Physics A · 56
Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD
2003 · Q. Fang, J.-Y. Zhang, et al. · Thin Solid Films · 54
Sol–gel preparation of thick titania coatings aided by organic binder materials
2004 · Wei Chen, Junying Zhang, et al. · Sensors and Actuators B Chemical · 49
Arrays of Ordered Pb Nanowires and Their Optical Properties for Laminated Polarizers
2002 · Y.-T. Pang, G.-W. Meng, et al. · Advanced Functional Materials · 47
The effect of corrosion and erosion on ceramic materials
1997 · Q. Fang, P.S. Sidky, et al. · Corrosion Science · 46
Laser morphological manipulation of gold nanoparticles periodically arranged on solid supports
2005 · F. Sun, W. Cai, et al. · Applied Physics B · 44
Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films
2005 · M. Liu, G. He, et al. · Applied Surface Science · 42
Effect of post deposition annealing on the optical properties of HfOxNy films
2006 · M. Liu, Q. Fang, et al. · Applied Physics Letters · 40
Structural, interfacial and optical characterization of ultrathin zirconia film grown by in situ thermal oxidation of sputtered metallic Zr films
2005 · G He, Q Fang, et al. · Nanotechnology · 37
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Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
2012 · S.M. Sultan, O.D. Clark, et al. · Microelectronic Engineering · 35
Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering
2007 · G. He, Q. Fang, et al. · Applied Surface Science · 34
Temperature-dependent structural stability and optical properties of ultrathin Hf–Al–O films grown by facing-target reactive sputtering
2007 · G. He, L. D. Zhang, et al. · Journal of Applied Physics · 33
The structure and thermal stability of TiO2 grown by the plasma oxidation of sputtered metallic Ti thin films
2004 · Gang He, Qi Fang, et al. · Chemical Physics Letters · 33
Works count: 117
Citation count: 2,522
H-index: 29
I10-index: 67
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