Get started
Author

Yuma Ueno

ORCID: 0009-0009-6807-8748
Observed ORCID: 0009-0009-6807-8748
OpenAlex ID: A5102604121
Low-thermal-budget crystallization of ferroelectric Al:HfO2 films by millisecond flash lamp annealing
2024 · Hideaki Tanimura, Yuma Ueno, et al. · Japanese Journal of Applied Physics · 8
High re-activation and precise diffusion control of epitaxial Si:P layers using flash lamp annealing
2025 · Yuma Ueno, Hideaki Tanimura, et al. · MRS Advances · 5
PDF
Ultra-rapid cooling in the millisecond timescale for the enhancement of polarization properties in Al:HfO2 thin films using flash lamp annealing
2024 · Hideaki Tanimura, Tomoya Mifune, et al. · Japanese Journal of Applied Physics · 5
PDF
Engineering ferroelectric interfaces: Delta-doping and millisecond flash lamp annealing for enhancing polarization properties in TiN/Al:HfO2/TiN capacitors
2025 · Hideaki Tanimura, Tomoya Mifune, et al. · Applied Physics Letters · 3
Improvement in the polarization properties in thin ferroelectric Hf0.5Zr0.5O2 films by two-step flash lamp annealing
2024 · Hideaki Tanimura, Yuto Ota, et al. · Japanese Journal of Applied Physics · 2
Enhancing the Electrical Characteristics of InGaSnOx (IGTO) Channel Thin-Film Transistors with Millisecond Flash Annealing
2026 · Ching-Hua Chiu, Yuma Ueno, et al. · International Conference on Solid State Devices and Materials (SSDM)
Oxygen Vacancy Dynamics Governing Wake-Up and Fatigue in Ferroelectric HfO2 Capacitors Revealed by Depth-Resolved HAXPES
2026 · Hideaki Tanimura, Tomoya Mifune, et al. · International Conference on Solid State Devices and Materials (SSDM)
Effects of Al concentration and annealing method on crystalline and ferroelectric properties of Al:HfO 2 thin films
2026 · Tomoya Mifune, Hideaki Tanimura, et al. · Japanese Journal of Applied Physics
Employment of Flash Annealing to Enhance Electron Mobility of Atomic Layer Deposited InZnOx Channel Thin-Film Transistors
2025 · Li Chi Peng, Yuma Ueno, et al. · International Conference on Solid State Devices and Materials (SSDM)
Flash-Assisted Flash Lamp Annealing Technology for High (Re-)Activation of Epitaxial Si:P Layers
2025 · Yuma Ueno, Hideaki Tanimura, et al. · International Workshop on Junction Technology
Corrigendum: “Low-thermal-budget crystallization of ferroelectric Al:HfO 2 films by millisecond flash lamp annealing” [Jpn. J. Appl. Phys. 63 09SP10 (2024)]
2024 · Hideaki Tanimura, Yuma Ueno, et al. · Japanese Journal of Applied Physics
PDF
Effects of Millisecond Flash Lamp Annealing on the Polarization and Crystallization in Thin Al:HfO2 Films
2024 · Hideaki Tanimura, Tomoya Mifune, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 12
Citation count: 23
H-index: 3
I10-index:
Year
Topic
Type