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Folarin Latinwo
Institution:
Synopsys (United States)
Observed institutions:
Princeton University,
Synopsys (United States)
ORCID:
0000-0002-2331-8607
Observed ORCID:
0000-0002-2331-8607
OpenAlex ID:
A5102967544
Pattern of property extrema in supercooled and stretched water models and a new correlation for predicting the stability limit of the liquid state
2019
·
Betul Uralcan
, Folarin Latinwo
, et al.
·
The Journal of Chemical Physics
·
11
High accuracy electromagnetic full-chip modeling for curvilinear mask OPC and ILT
2024
·
Enas Sakr
, Zac Levinson
, et al.
·
DTCO and Computational Patterning
·
3
Improved validation and optimization of physics-based NTD compact modeling flows
2019
·
Folarin Latinwo
, Delian Yang
, et al.
·
SPIE Optical Microlithography
·
3
3D NTD resist deformation compact model for OPC and ILT applications
2018
·
Kevin Lucas
, Rich Wu
, et al.
·
SPIE Photomask Technology Conference
·
2
Advances in full-chip three-dimensional resist modeling for low k1 EUV and DUV lithography
2024
·
Betsy Grubbs
, Bernd Kuechler
, et al.
·
DTCO and Computational Patterning
·
1
Modeling accuracy and TAT improvements for next generation mask error correction
2023
·
Alex Zepka
, Folarin Latinwo
, et al.
·
DTCO and Computational Patterning
·
1
Crystal Prediction via Genetic Algorithms in a Model Chiral System
2022
·
Nikolai D. Petsev
, Arash Nikoubashman
, et al.
·
The Journal of Physical Chemistry B
·
1
Beyond design-rule test pattern coverage for low-K1 hotspot and process variability reduction
2025
·
Elizabeth Grubbs
, Enas Sakr
, et al.
·
DTCO and Computational Patterning
ML-model based curvilinear mask error correction
2023
·
Linghui Wu
, John Valadez
, et al.
·
SPIE Photomask Technology Conference
Improving OPC modeling accuracy with rigorous and compact modeling deformation effects in photoresists
2023
·
Folarin Latinwo
, Bernd Kuechler
, et al.
·
DTCO and Computational Patterning
Improved prediction of assist feature printing with physically-based NTD compact models
2022
·
Folarin Latinwo
, Yulu Chen
, et al.
·
DTCO and Computational Patterning
Increased OPC modeling accuracy of deformation effects in positive-tone development photoresists
2021
·
Folarin Latinwo
, Yulu Chen
, et al.
·
SPIE Optical Microlithography
Investigation of machine learning for dual OPC and assist feature printing optimization
2019
·
Marco Guajardo
, Yulu Chen
, et al.
·
Design-Process-Technology Co-optimization for Manufacturability
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Works count:
13
Citation count:
22
H-index:
3
I10-index:
1
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