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Gi Won Shin

Observed name: Gi-Won Shin
Observed institution: Kwangwoon University
ORCID: 0000-0003-3922-1022
Observed ORCID: 0000-0003-3922-1022
OpenAlex ID: A5102969379
Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
2024 · Hee-Tae Kwon, In-Young Bang, et al. · Nanomaterials · 14
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Plasma Etching of Silicon at a High Flow and a High Pressure of NF3 in Reactive Ion Etching
2019 · Hee-Tae Kwon, Woo-Jae Kim, et al. · Journal of the Korean Physical Society · 7
Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer
2021 · Woo-Jae Kim, In-Young Bang, et al. · Materials · 6
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Etching characteristics of NF3 and F3NO at reactive ion etching plasma for silicon oxide and silicon nitride
2021 · Woo Jae Kim, In Young Bang, et al. · Journal of the Korean Physical Society · 4
Measurement of re-entry plasma density using microwave reflectometer in laboratory
2022 · Gi Won Shin, Jae Hyeon Kim, et al. · Review of Scientific Instruments · 2
Correlation between Density of Reentry Plasma and Frequency of Attenuated Electromagnetic Signals Based on Laboratory Measurements
2023 · Gi-Won Shin, Jae-Hyeon Kim, et al. · Aerospace · 1
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In-situ electron density measurement in inductively coupled plasma using microwave reflectometer by Wi-Fi antenna on wafer
2023 · Gi Won Shin, Jae Hyeon Kim, et al. · Plasma Sources Science and Technology
Investigating the Wafer Temperature in an Atmospheric-Pressure Plasma Process
2020 · Gi-Chung Kwon, Woo Jae Kim, et al. · Journal of the Korean Physical Society
Dry Etching Using Atmospheric Plasma for Crystalline Silicon Solar Cells
2017 · Sang Hyuk Hwang, Hee Tae Kwon, et al. · Korean Journal of Materials Research
The study to flat-type generate of magnetic field with CW (Continue wave) frequency and AM (Amplitude modulation) frequency
2015 · Gi Won Shin, Chang Ho Kang, et al. · 한국진공학회 학술발표회초록집
Works count: 10
Citation count: 34
H-index: 4
I10-index: 1
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