Author

Jonathan Planchot

Observed names: J Planchot, J. Planchot, Jonathon Planchot, Planchot, J.

Institution: STMicroelectronics (France)

Observed institutions: STMicroelectronics (France), STMicroelectronics (Italy)

OpenAlex ID: A5107837018

Integrated SiN on SOI dual photonic devices for advanced datacom solutions

2018 · Sylvain Guerber, Carlos Alonso-Ramos, et al. · Silicon Photonics: From Fundamental Research to Manufacturing · 26

Developments in 300mm silicon photonics using traditional CMOS fabrication methods and materials

2017 · C. Baudot, M. Douix, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 21

Advanced OPC Mask-3D and Resist-3D modeling

2014 · A. Szucs, J. Planchot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Fiber grating coupler development for Si-photonics process design kits at CEA-LETI

2019 · Daivid Fowler, Philippe Grosse, et al. · Smart Photonic and Optoelectronic Integrated Circuits · 16

DAPHNE silicon photonics technological platform for research and development on WDM applications

2016 · Charles Baudot, Antonio Fincato, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

SiGe-enhanced Si capacitive modulator integration in a 300 mm silicon photonics platform for low power consumption

2019 · Maurin Douix, Diego Perez-Galacho, et al. · Optics Express · 10

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

2007 · Mazen Saied, Franck Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Optical Phased Array for 905-nm LIDAR applications integrated on 300mm Si-Photonic Platform

2022 · S. Monfray, S. Guerber, et al. · Optical Fiber Communication Conference · 5

Best focus shift mitigation for extending the depth of focus

2013 · A. Szucs, J. Planchot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Study of SRAF placement for contact at 45 nm and 32 nm node

2008 · V. Farys, F. Robert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Resist 3D model based OPC for 28nm metal process window enlargement

2016 · P. Fanton, J. C. Le Denmat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Patterning critical dimension control for advanced logic nodes

2015 · Bertrand Le-Gratiet, Jean De-Caunes, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3

Full field lithographical verification using scanner and mask intrafield fingerprint

2012 · J. Planchot, L. Depre, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window

2007 · M. Saied, F. Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Evaluation of Advanced Process Integration Options for next Generation of Si-Photonics platform

2018 · F. Boeuf, C. Baudot, et al. · International Conference on Solid State Devices and Materials (SSDM) · 2

Model-based mask verification

2007 · Frank Foussadier, Frank Sundermann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Advanced solutions in silicon photonics using traditional fabrication methods and materials of CMOS technologies (Conference Presentation)

2018 · Charles Baudot, Maurin Douix, et al. · SPIE Silicon Photonics · 1

Model-based mask verification on critical 45nm logic masks

2008 · F. Sundermann, F. Foussadier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Characterization of inverse SRAF for active layer trenches on 45-nm node

2007 · Jean-Christophe Urbani, Jean-Damien Chapon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner

2007 · Yorick Trouiller, Vincent Farys, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Analysis of the diffraction pattern for optimal assist feature placement

2007 · Amandine Borjon, Jérôme Belledent, et al. · Microelectronic Engineering · 1

Developments in 300mm Low-Power Si Capacitive Modulators Invited paper

2018 · Baudot, C., Charlet, I., et al. · HAL

伝統的CMOS製造法と材料を用いた300mmシリコンフォトニクスの開発【Powered by NICT】

2017 · C Baudot, M Douix, et al. · IEEE Conference Proceedings

Advanced OPC Mask-3D and Resist-3D modelling

2014 · Szücs, A., Planchot, J., et al. · HAL

Impact of modelisation pixel size on OPC consistency

2009 · Franck Foussadier, Emek Yesilada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 28

Citation count: 153

H-index: 7

I10-index: 6