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Hood Chatham
Observed names:
H. Chatham,
H. L. Chatham
Observed institutions:
Georgia Institute of Technology,
National Institute of Standards and Technology,
Joint Institute for Laboratory Astrophysics,
Bethany University,
Vitalant
OpenAlex ID:
A5109087221
Oxygen diffusion barrier properties of transparent oxide coatings on polymeric substrates
1996
·
Hood Chatham
·
Surface and Coatings Technology
·
361
Total and partial electron collisional ionization cross sections for CH4, C2H6, SiH4, and Si2H6
1984
·
H. Chatham
, D. Hils
, et al.
·
The Journal of Chemical Physics
·
292
Radical species in argon-silane discharges
1983
·
R. Robertson
, D. Hils
, et al.
·
Applied Physics Letters
·
141
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
2004
·
Yoshihide Senzaki
, Seung Park
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
104
Ion chemistry in silane dc discharges
1985
·
H. Chatham
, A. Gallagher
·
Journal of Applied Physics
·
81
Doubly charged ion mass spectra: III—N‐alkanes
1982
·
B. E. Jones
, L. E. Abbey
, et al.
·
Organic Mass Spectrometry
·
52
Reactions of He+, Ne+, and Ar+ with CH4, C2H6, SiH4, and Si2H6
1983
·
H. Chatham
, D. Hils
, et al.
·
The Journal of Chemical Physics
·
50
High Deposition Rate P-I-N Solar Cells Prepared from Disilane Using VHF Discharges
1989
·
H. Chatham
, P. K. Bhat
·
MRS Proceedings
·
28
High-efficiency amorphous silicon p-i-n solar cells deposited from disilane at rates up to 2 nm/s using VHF discharges
1989
·
Hood Chatham
, Pawan Bhat
, et al.
·
Journal of Non-Crystalline Solids
·
24
Improving tunneling junction in amorphous silicon tandem solar cells
1990
·
D. S. Shen
, R. E. I. Schropp
, et al.
·
Applied Physics Letters
·
21
Equivalent oxide thickness reduction of interpoly dielectric using ALD-Al2O3 for flash device application
2004
·
Tai-Peng Lee
, Chuck Jang
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
16
High-deposition-rate amorphous silicon solar cells: silane or disilane?
1991
·
D.S. Shen
, H. Chatham
, et al.
·
Solar Cells
·
7
Amorphous silicon solar cells prepared at high deposition rates
1990
·
Dashen S. Shen
, Pawan Bhat
, et al.
·
STIN
·
7
Comparative Discharge Diagnostic Study of Silane, Disilane, and Germane RF Discharges Using Optical Emission Spectroscopy and Mass Spectrometry
1988
·
H. Chatham
, P. K. Bhat
·
MRS Proceedings
·
6
Derivation of Rate Constants for the Batch Furnace Radical Oxidation of Silicon Wafers via Hydrogen Combustion
2009
·
Jeff Bailey
, Thomas Qiu
, et al.
·
Journal of The Electrochemical Society
·
4
High efficiency a-Si/a-Si tandem solar cells
2002
·
D.S. Shen
, R.E.I. Schropp
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
4
Preparation and properties of high deposition rate a-Si:H films and solar cells using disilane
1988
·
P.K. Bhat
, C. Marshall
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
4
Low Temperature Silicon Dioxide Deposition and Characterization
2006
·
Hood Chatham
, Martin Mogaard
, et al.
·
MRS Proceedings
·
2
Atomic layer deposition of high-k thin films for gate and capacitor dielectrics
2004
·
Y. Senzaki
, H. Chatham
, et al.
·
IEEE International Conference on IC Design and Technology (ICICDT)
·
2
Recent progress in multichamber deposition of high-quality amorphous silicon solar cells on planar and compound curved substrates at GSI
1989
·
R.E.I. Schropp
, B. Von Roedern
, et al.
·
Solar Cells
·
2
Low-Temperature Deposition of Silicon Dioxide and Silicon Nitride for Dual Spacer Application
2007
·
Hood Chatham
, Martin Mogaard
, et al.
·
ASMC proceedings
·
1
VUV Reflectometry for Thin Film Thickness & Composition Metrology and Process Development & Control
2007
·
Matthew Weldon
, Hood Chatham
, et al.
·
AIP conference proceedings
·
1
PDF
B(Ch3)3 as P Layer Doping Gas
1990
·
D. S. Shen
, H. Chatham
, et al.
·
MRS Proceedings
·
1
Preparation and properties of high deposition a-Si:H films and solar cells using disilane
1989
·
Hood Chatham
, Pawan Bhat
·
NASA STI/Recon Technical Report N
·
1
ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
2006
·
Yoshi Senzaki
, James Gutt
, et al.
·
ECS Meeting Abstracts
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Works count:
30
Citation count:
1,212
H-index:
11
I10-index:
11
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