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Author

John G. Long

Observed name: J G Long
Observed institution: Johns Hopkins University
OpenAlex ID: A5109147455
Electrochemical deposition of metals onto silicon
1998 · G Oskam, J G Long, et al. · Journal of Physics D Applied Physics · 377
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Nucleation and Growth of Copper on TiN from Pyrophosphate Solution
2001 · Aleksandar Radisic, John G. Long, et al. · Journal of The Electrochemical Society · 119
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Electrochemical Characterization of Adsorption-Desorption of the Cuprous-Suppressor-Chloride Complex during Electrodeposition of Copper
2006 · John G. Long, Peter C. Searson, et al. · Journal of The Electrochemical Society · 69
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Electrochemical Deposition of Metals on Semiconductors
1996 · Gerko Oskam, John G. Long, et al. · MRS Proceedings · 9
Electrodeposition of Ni/SiC contacts
2003 · Gerko Oskam, Parimal J. Patel, et al. · Journal of Applied Physics · 4
Ammonia dissociation in the fluidised bed furnace
2005 · Peter C. King, R. W. Reynoldson, et al. · Materials Forum · 3
An Electrochemical Impedance Spectroscopy and Pseudo Steady State Voltammetric Study of the Chloride-suppressor Complex Formed on the Copper Surface in Plating Baths That Exhibit Superfilling Used in the Dual Damascene Process During the Copper Metallization of Semiconductors
2015 · John G. Long
Works count: 8
Citation count: 581
H-index: 4
I10-index: 3
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