Author

Roel Moors

Observed names: Moors, R, Moors, R., R. Moors

Institution: ASML (Netherlands)

Observed institutions: Eindhoven University of Technology, ASML (Netherlands)

OpenAlex ID: A5109203420

Plasma sources for EUV lithography exposure tools

2004 · Vadim Banine, Roel Moors · Journal of Physics D Applied Physics · 100

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First performance results of the ASML alpha demo tool

2006 · Hans Meiling, Henk Meijer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 80

Sn etching with hydrogen radicals to clean EUV optics

2009 · M.M.J.W. van Herpen, D.J.W. Klunder, et al. · Chemical Physics Letters · 71

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

2018 · Mark A. van de Kerkhof, Arthur W. E. Minnaert, et al. · Extreme Ultraviolet (EUV) Lithography · 44

Detection and characterization of carbon contamination on EUV multilayer mirrors

2009 · Juequan Chen, Eric Louis, et al. · Optics Express · 37

Relationship between an EUV source and the performance of an EUV lithographic system

2000 · Vadim Banine, Jos P. Benschop, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 33

Characterization of EUV induced carbon films using laser-generated surface acoustic waves

2008 · Juequan Chen, Chris J. Lee, et al. · Diamond and Related Materials · 18

Extreme-ultraviolet source specifications: tradeoffs and requirements

2012 · Roel Moors, Vadim Y. Banine, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 15

Particle Cleaning of EUV Reticles

2009 · Luigi Scaccabarozzi, Niels A. Lammers, et al. · Journal of Adhesion Science and Technology · 12

Kinetic study of high-pressure pulverized coal char combustion: Experiments and modelling

1997 · Vadim Banin, Roel Moors, et al. · Fuel · 11

Electrostatic mask protection for extreme ultraviolet lithography

2002 · Roel Moors, Gert-Jan Heerens · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4

Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics

2009 · Juequan Chen, Eric Louis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

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EUV optics portfolio extended: first high-NA systems delivered and showing excellent imaging results

2025 · Claus Zahlten, Paul Gräupner, et al. · SPIE Optical and EUV Nanolithography

Ways to monitor EUV induced carbon contamination of optics

2009 · Chen, Juequan, Louis, Eric, et al. · University of Twente Research Information

EUV reticles Reticle handling Particles Nanoscale Particle-free handling Storage

2006 · M.P. Oderwald, E.L. Ham, et al. · TNO Repository

Works count: 19

Citation count: 426

H-index: 10

I10-index: 10