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K. Early

Observed names: Kathy Early, Kathy R. Early
OpenAlex ID: A5110072794
Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm
1990 · K. Early, M.L. Schattenburg, et al. · Microelectronic Engineering · 72
89-GHz f/sub T/ room-temperature silicon MOSFETs
1992 · R.-H. Yan, K.F. Lee, et al. · IEEE Electron Device Letters · 28
High performance 0.1- mu m room temperature Si MOSFETs
2003 · R.H. Yan, K.F. Lee, et al. · Symposium on VLSI Technology · 22
Fabrication and characterization of high-flatness mesa-etched silicon nitride x-ray masks
1991 · A. Moel, W. Chu, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 18
Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographies
1992 · K. Early, D. M. Tennant, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
Fabrication and testing of 0.1-μm-linewidth microgap x-ray masks
1990 · M. L. Schattenburg, K. Early, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 13
Characterization of AZ PN114 resist for soft-x-ray projection lithography
1993 · K. Early, D. M. Tennant, et al. · Applied Optics · 11
Novel postexposure bake simulator: First results
1995 · Luigi Capodieci, Azalia Krasnoperova, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 8
Soft-x-ray projection imaging with a 1:1 ring-field optic
1993 · A. A. MacDowell, J. E. Bjorkholm, et al. · Applied Optics · 6
Repair of soft-x-ray optical elements by stripping and redeposition of Mo/Si reflective coatings
1993 · K. Early, D. L. Windt, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
High-performance deep-submicrometer Si MOSFETs using vertical doping engineering
1992 · R.H. Yan, K.F. Lee, et al. · IEEE Transactions on Electron Devices · 4
Gate technology for 89 GHz vertical doping engineered Si metal–oxide semiconductor field effect transistor
1992 · D. Y. Jeon, D. M. Tennant, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2
Novel vertical silicon-membrane structure and its application to Josephson devices
1992 · G. E. Rittenhouse, K. Early, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2
Diffraction in proximity x-ray lithography: Comparing theory and experiment for gratings, lines, and spaces
1992 · K. Early, M.L. Schattenburg, et al. · Microelectronic Engineering · 2
High Performance Deep Submicron Si MOSFETS Using Vertical Doping Engineering
2005 · R.H. Yan, K.F. Lee, et al. · Conference digest · 1
Simulation of Soft-X-Ray Images from a 1:1 Ring-Field Optic
1993 · O. R. Wood, R. M. D'Souza, et al. · OSA Topical Meeting on Soft X-Ray Projection Lithography · 1
Characterization of Ray-PN Resist for Soft-X-Ray Projection Lithography
1992 · K. Early, D. M. Tennant, et al. · OSA Topical Meeting on Soft X-Ray Projection Lithography · 1
Chemically Amplified Soft X-Ray Resists: Sensitivity, Resolution, and Molecular Photodesorption
1992 · Glenn D. Kubiak, Robert Q. Hwang, et al. · OSA Topical Meeting on Soft X-Ray Projection Lithography · 1
Soft-X-Ray Projection Imaging Using a 1:1 Ring-Field Optic
1992 · A. A. MacDowell, J. E. Bjorkholm, et al. · OSA Topical Meeting on Soft X-Ray Projection Lithography
Works count: 19
Citation count: 211
H-index: 8
I10-index: 7
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