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Author

Seungmin Jo

Observed names: S. B. Jo, S.-B. Jo
Institution: Soongsil University
ORCID: 0009-0006-5454-4646
Observed ORCID: 0009-0006-5454-4646
OpenAlex ID: A5111118146
Characterization of a modified Bosch-type process for silicon mold fabrication
2005 · S.-B. Jo, M.-W. Lee, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 38
Novel Form Birefringence Modeling for an Ultracompact Sensor in Porous Silicon Films Using Polarization Interferometry
2004 · B. O, C.-H. Choi, et al. · IEEE Photonics Technology Letters · 8
Suppression of interfacial layers in ZrO 2 /TiN capacitors by atomic layer deposition using ligand-engineered Zr precursors for scalable DRAM
2025 · Hyeongjun Kim, Juan Hong, et al. · Materials Horizons · 7
Atomic layer etching of ZrO2 thin films for DRAM capacitors using NF3 plasma and TiCl4
2025 · Haram Yang, Hyeongjun Kim, et al. · Ceramics International · 7
Improvement of the surface characteristics of sputtered metal layer for a MEMS micro-mirror switch
2003 · M.-W. Lee, S.-B. Jo, et al. · Thin Solid Films · 1
Self–Activating atomic layer deposition: A kinetic strategy for growth of metastable, high work function MoO2 thin films
2026 · Hyun-June Park, Kyu-Hwan Seok, et al. · Applied Surface Science
Author response for "Suppression of Interfacial Layers in ZrO₂/TiN Capacitors by Atomic Layer Deposition Using Ligand-Engineered Zr Precursors for Scalable DRAM"
2025 · Hyeongjun Kim, Juan Hong, et al. · Publons reviews and discussion
Author response for "Suppression of Interfacial Layers in ZrO₂/TiN Capacitors by Atomic Layer Deposition Using Ligand-Engineered Zr Precursors for Scalable DRAM"
2025 · Hyeongjun Kim, Juan Hong, et al. · Publons reviews and discussion
Replication-based fabrication for an optical device that incorporates vertically curved structures
2006 · M. W. Lee, K. J. Lim, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Works count: 9
Citation count: 61
H-index: 4
I10-index: 1
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