Author

J BENBRAHIM

Institutions: Centre National de la Recherche Scientifique, National Institute of Applied Science and Technology, Institut National des Sciences Appliquées de Lyon

Observed institutions: Centre National de la Recherche Scientifique, National Institute of Applied Science and Technology, Institut National des Sciences Appliquées de Lyon

OpenAlex ID: A5111592766

RTA processing of ionic boron implanted in silicon through screen oxide films: effects of some technological parameters

1998 · L KAABI, C GONTRAND, et al. · Annales de Chimie Science des Matériaux

Works count: 1

Citation count:

H-index:

I10-index: