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Toshiharu Nakashima

Observed name: Nakashima Toshiharu
Institution: Nikon (Japan)
Observed institution: Nikon (Japan)
OpenAlex ID: A5111746635
Thermal aberration control in projection lens
2008 · Toshiharu Nakashima, Yasuhiro Ohmura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
High-order aberration control during exposure for leading-edge lithography projection optics
2016 · Yasuhiro Ohmura, Yosuke Tsuge, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Reduced basis method for source mask optimization
2010 · Jan Pomplun, Lin Zschiedrich, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
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Tolerancing analysis of customized illumination for practical applications of source and mask optimization
2010 · Tomoyuki Matsuyama, Naonori Kita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Polarization-dependent proximity effects
2007 · Jacek K. Tyminski, Tomoyuki Matsuyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
A study of source and mask optimization for ArF scanners
2009 · Tomoyuki Matsuyama, Toshiharu Nakashima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Thermal aberration control for low-k1 lithography
2007 · Yusaku Uehara, Tomoyuki Matsuyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Zernike sensitivity method for CD distribution
2003 · Toshiharu Nakashima, Steve D. Slonaker, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Current status of high-index immersion lithography development
2007 · Yasuhiro Ohmura, Toshiharu Nakashima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Scanner performance predictor and optimizer in further low-k1 lithography
2014 · Hajime Aoyama, Toshiharu Nakashima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns
2016 · Masato Shibuya, Akira Takada, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5
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Scanner-dependent optical proximity effects
2009 · Jacek K. Tyminski, Tomoyuki Matsuyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Feasibility studies of source and mask optimization
2009 · Toshiharu Nakashima, Tomoyuki Matsuyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Impact of Zernike cross-term on linewidth control
2002 · Toshiharu Nakashima, Kenji Higashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
An intelligent imaging system for ArF scanner
2008 · Tomoyuki Matsuyama, Yasuhiro Ohmura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Study of high NA imaging with polarized illumination
2005 · Tomoyuki Matsuyama, Toshiharu Nakashima · Optical Microlithography XVIII · 3
Studies of high index immersion lithography
2008 · Yasuhiro Ohmura, Hiroyuki Nagasaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm node
2006 · Ken Ozawa, Boontarika Thunnakart, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Lens aberration control for fine patterning with PSM
2001 · Takehito Kudo, Shigeru Hirukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Comparing the experimental resist image with aerial image intensity in high-NA projection lense
2015 · Masato Shibuya, Akira Takada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
An imaging system for extended ArF immersion lithography
2008 · Tomoyuki Matsuyama, Yasuhiro Ohmura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Scanner parameter sensitivity analysis for OPE
2007 · Tomoyuki Matsuyama, Toshiharu Nakashima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Fractal model applied wavefront aberration for the expression of local flare
2006 · Toshiharu Nakashima, Taro Ogata · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Technology qualification for 65-nm node
2005 · Jacek K. Tyminski, Toshiharu Nakashima · Optical Microlithography XVIII
Simulation benchmarking
2003 · Jacek K. Tyminski, Toshiharu Nakashima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 25
Citation count: 135
H-index: 8
I10-index: 4
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