Author

Jack Lin

Observed names: J. Lin, LIN, JACK
Observed institution: Tokyo Institute of Technology
OpenAlex ID: A5112102597
2009 · Martin Weis, Jack Lin, et al. · The Journal of Physical Chemistry C · 45
2009 · Martin Weis, Motoharu Nakao, et al. · Thin Solid Films · 22
2011 · Keanchuan Lee, Martin Weis, et al. · Journal of Applied Physics · 14
2008 · Martin Weis, Jack Lin, et al. · Journal of Applied Physics · 11
2010 · Jack Lin, Martin Weis, et al. · Japanese Journal of Applied Physics · 9
2009 · Jack Lin, Martin Weis, et al. · Japanese Journal of Applied Physics · 2
2010 · J. Lin, M. Weis, et al. · International Conference on Solid State Devices and Materials (SSDM)
2009 · M. Weis, D. Taguchi, et al. · International Conference on Solid State Devices and Materials (SSDM)
2009 · LIN, JACK, Weis, Martin, et al. · Institutional Repositories DataBase (IRDB)
2008 · J. Lin, M. Weis, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 25
Citation count: 209
H-index: 8
I10-index: 7
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